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Volumn 4, Issue 102, 2014, Pages 58724-58731
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Atomic layer deposition of crystalline Bi2O3 thin films and their conversion into Bi2S3 by thermal vapor sulfurization
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Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION SPECTROSCOPY;
ATOMIC FORCE MICROSCOPY;
ATOMIC LAYER DEPOSITION;
BISMUTH COMPOUNDS;
CHROMIUM COMPOUNDS;
CRYSTALLINE MATERIALS;
HETEROJUNCTIONS;
LAYERED SEMICONDUCTORS;
LIGHT ABSORPTION;
OPTOELECTRONIC DEVICES;
QUARTZ;
SEMICONDUCTING BISMUTH COMPOUNDS;
SILICON;
SOLAR ENERGY;
SUBSTRATES;
SURFACE ROUGHNESS;
THIN FILMS;
VAPOR DEPOSITION;
X RAY PHOTOELECTRON SPECTROSCOPY;
DIFFERENT SUBSTRATES;
ELEVATED TEMPERATURE;
LARGE ABSORPTION COEFFICIENT;
N-TYPE SEMICONDUCTORS;
NON-STOICHIOMETRIC;
QUARTZ SUBSTRATE;
VISIBLE LIGHT;
WAVELENGTH RANGES;
SULFUR COMPOUNDS;
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EID: 84911904071
PISSN: None
EISSN: 20462069
Source Type: Journal
DOI: 10.1039/c4ra09896j Document Type: Article |
Times cited : (31)
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References (48)
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