Effects of elastic strain and diffusion-limited aggregation on morphological instabilities in sputtered nitride thin films

Journal of Materials Research

Volumn 29, Issue 16, 2014, Pages 1711-1719

  Vasua, Kuraganti ^a,b   Krishna, Mamidipudi Ghanashyam ^a   Padmanabhan, Kuppuswamy Anantha ^a  

^a UNIVERSITY OF HYDERABAD   (India)

^b JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH   (India)

Author keywords

Microstructure; Sputtering; TiN thin films

Indexed keywords

AGGLOMERATION; AMORPHOUS SILICON; BOROSILICATE GLASS; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; NIOBIUM COMPOUNDS; SILICON WAFERS; SINGLE CRYSTALS; SPUTTERING; SUBSTRATES; TITANIUM NITRIDE;

ASARO-TILLER-GRINFELD; DENDRITIC STRUCTURES; DIFFUSION LIMITED AGGREGATION; MORPHOLOGICAL INSTABILITY; NITRIDE THIN FILMS; RF-MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; TIN THIN FILMS;

THIN FILMS;

EID: 84910625451     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2014.221     Document Type: Article

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