On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method

Applied Catalysis B: Environmental

Volumn 165, Issue , 2015, Pages 344-350

  Kment, S ^a   Hubicka, Z ^b   Krysa, J ^c   Sekora, D ^d   Zlamal, M ^c   Olejnicek, J ^b   Cada, M ^b   Ksirova, P ^b   Remes, Z ^b   Schmuki, P ^e   Schubert, E ^d   Zboril, R ^a  

^a PALACKÝ UNIVERSITY   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

^d UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^e UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

ALD; Alumina passivation layer; Hematite; HiPIMS; Photoelectrochemical water splitting; Very thin films

Indexed keywords

ALD; HIPIMS; PASSIVATION LAYER; PHOTOELECTROCHEMICAL WATER SPLITTING; VERY THIN FILMS;

HEMATITE;

EID: 84908627727     PISSN: 09263373     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apcatb.2014.10.015     Document Type: Article

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