Current and voltage limiting processes in thin film hematite electrodes

Journal of Physical Chemistry C

Volumn 115, Issue 16, 2011, Pages 8393-8399

  Klahr, Benjamin M ^a   Hamann, Thomas W ^a  

^a MICHIGAN STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED POTENTIALS; BUILT-IN VOLTAGE; ELECTRON TRANSFER; LIMITING PROCESS; OPEN-CIRCUIT PHOTOVOLTAGE; PHOTO-VOLTAGE; PHOTOCURRENT DENSITY; RATE-LIMITING PROCESS; RATE-LIMITING STEPS; RECOMBINATION MECHANISMS; REDOX POTENTIALS; REDOX SHUTTLE; STEADY-STATE CURRENTS; SYSTEMATIC VARIATION; TRANSPARENT CONDUCTIVE OXIDES; WATER OXIDATION;

ATOMIC LAYER DEPOSITION; CONDUCTIVE FILMS; DEPOSITION; ELECTRODES; ELECTROLYTES; HETEROJUNCTIONS; IRON ORES; OXIDE FILMS; REDOX REACTIONS; THIN FILMS; VAPOR DEPOSITION;

HEMATITE;

EID: 79955379979     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp200197d     Document Type: Article

References (49)

1. Energy Information Administration: www.eia.doe.gov.
2. Pachauri, R. K. a. R., A. IPCC 2007: Climate Change 2007: Synthesis Report. Contribution of Working Groups I, II, and III to the Fourth Assessment Report to the Intergovernmental Panel on Climate Change; Geneva, Switzerland, 2008.
3. Kerr, R. A. Science 2007, 318 (5854) 1230-1231
4. Lewis, N. S. MRS Bull. 2007, 32 (10) 808-820
5. Crabtree, G. W.; Lewis, N. S. Phys. Today 2007, 60 (3) 37-42
6. Green, M. A.; Emery, K.; Hishikawa, Y.; Warta, W. Prog. Photovolt. 2009, 17 (1) 85-94
7. Bindaar, G.; Dareedwards, M. P.; Goodenough, J. B.; Hamnett, A. J. Chem. Soc.-Faraday. Trans. 1983, 79, 1199-1213
8. Hardee, K. L.; Bard, A. J. J. Electrochem. Soc. 1977, 124 (2) 215-224
9. Souza, F. L.; Lopes, K. P.; Longo, E.; Leite, E. R. Phys. Chem. Chem. Phys. 2009, 11 (8) 1215-1219
10. Finklea, H. O. Semiconductor Electrodes: Elsevier: Amsterdam, 1988; pp 147 - 202.
11. Beermann, N.; Vayssieres, L.; Lindquist, S. E.; Hagfeldt, A. J. Electrochem. Soc. 2000, 147 (7) 2456-2461
12. Sanchez, H. L.; Steinfink, H.; White, H. S. J. Solid State Chem. 1982, 41, 90-96
13. Kennedy, J. H.; Frese, K. W. J. Electrochem. Soc. 1978, 125 (5) 709-714
14. Bosman, A. J.; Vandaal, H. J. Adv. Phys. 1970, 19 (77) 78
15. Glasscock, J. A.; Barnes, P. R. F.; Plumb, I. C.; Bendavid, A.; Martin, P. J. Thin Solid Films 2008, 516 (8) 1716-1724
16. Itoh, K.; Bockris, J. O. J. Appl. Phys. 1984, 56 (3) 874-876
17. Itoh, K.; Bockris, J. O. J. Electrochem. Soc. 1984, 131 (6) 1266-1271
18. Bjorksten, U.; Moser, J.; Gratzel, M. Chem. Mater. 1994, 6 (6) 858-863
19. Hahn, N. T.; Ye, H. C.; Flaherty, D. W.; Bard, A. J.; Mullins, C. B. ACS Nano 2010, 4 (4) 1977-1986
20. Mohapatra, S. K.; John, S. E.; Banerjee, S.; Misra, M. Chem. Mater. 2009, 21 (14) 3048-3055
21. Sivula, K.; Zboril, R.; Le Formal, F.; Robert, R.; Weidenkaff, A.; Tucek, J.; Frydrych, J.; Gratzel, M. J. Am. Chem. Soc. 2010, 132 (21) 7436-7444
22. Cherepy, N. J.; Liston, D. B.; Lovejoy, J. A.; Deng, H. M.; Zhang, J. Z. J. Phys. Chem. B 1998, 102 (5) 770-776
23. Cesar, I.; Sivula, K.; Kay, A.; Zboril, R.; Graetzel, M. J. Phys. Chem. C 2009, 113 (2) 772-782
24. Duret, A.; Gratzel, M. J. Phys. Chem. B 2005, 109 (36) 17184-17191
25. Klahr, B. M.; Martinson, A. B. F.; Hamann, T. W. Langmuir 2011, 27 (1) 461-468
26. George, S. M. Chem. Rev. 2010, 110 (1) 111-131
27. Standridge, S. D.; Schatz, G. C.; Hupp, J. T. J. Am. Chem. Soc. 2009, 131 (24) 8407-8409
28. Dotan, H.; Sivula, K.; Gratzel, M.; Rothschild, A.; Warren, S. C. Energy Environ. Sci. 2011, 4 (3) 958-964
29. Leipoldt, J. G.; Bok, L. D. C.; Cilliers, P. J. Z. Anorg. Allg. Chem. 1974, 409 (3) 343-344
30. Leipoldt, J. G.; Bok, L. D. C.; Cilliers, P. J. Z. Anorg. Allg. Chem. 1974, 407 (3) 350-352
31. Klahr, B. M.; Hamann, T. W. J. Phys. Chem. C 2009, 113 (31) 14040-14045
32. Nelson, J. J.; Amick, T. J.; Elliott, C. M. J. Phys. Chem. C 2008, 112 (46) 18255-18263
33. Nelson, J. The Physics of Solar Cells; Imperial College Press: London, 2003; pp 9 - 11.
34. Lewis, N. S.; Rosenbluth, M. L. Theory of Semiconductor Materials. In Photocatalysis: Fundamentals and Applications; Serpone, N.; Pelizzetti, E., Eds.; John Wiley & Sons: New York, 1989.
35. Fajardo, A. M.; Lewis, N. S. J. Phys. Chem. B 1997, 101 (51) 11136-11151
36. Launay, J. C.; Horowitz, G. J. Cryst. Growth 1982, 57 (1) 118-124
37. Anderman, M.; Kennedy, J. H. J. Electrochem. Soc. 1984, 131 (1) 21-26
38. McGregor, K. G.; Calvin, M.; Otvos, J. W. J. Appl. Phys. 1979, 50 (1) 369-373
39. Kennedy, J. H.; Frese, K. W. J. Electrochem. Soc. 1978, 125 (5) 723-726
40. Tahir, A. A.; Wijayantha, K. G. U.; Saremi-Yarahmadi, S.; Mazhar, M.; McKee, V. Chem. Mater. 2009, 21 (16) 3763-3772
41. Dareedwards, M. P.; Goodenough, J. B.; Hamnett, A.; Trevellick, P. R. J. Chem. Soc., Faraday Trans. 1 F 1983, 79, 2027-2041
42. Tan, M. X.; Laibinis, P. E.; Nguyen, S. T.; Kesselman, J. M.; Stanton, C. E.; Lewis, N. S. Prog. Inorg. Chem. 1994, 41, 21-144
43. Hamann, T. W.; Gstrein, F.; Brunschwig, B. S.; Lewis, N. S. J. Am. Chem. Soc. 2005, 127 (40) 13949-13954
44. Hamann, T. W.; Gstrein, F.; Brunschwig, B. S.; Lewis, N. S. Chem. Phys. 2006, 326, 15-23
45. Ondersma, J. W.; Hamann, T. W. J. Phys. Chem. C 2010, 114 (1) 638-645
46. Hamann, T. W.; Farha, O. K.; Hupp, J. T. J. Phys. Chem. C 2008, 112 (49) 19756-19764
47. DeVries, M. J.; Pellin, M. J.; Hupp, J. T. Langmuir 2010, 26 (11) 9082-9087
48. Spray, R. L.; McDonald, K. J.; Choi, K.-S. J. Phys. Chem. C 2011, 115 (8) 3497-3506
49. Le Formal, F.; Tetreault, N.; Cornuz, M.; Moehl, T.; Gratzel, M.; Sivula, K. Chem. Sci. 2011, 2 (4) 737-743.