The crystallization of amorphous aluminum oxide thin films grown on NiAl (100)

Journal of the American Ceramic Society

Volumn 97, Issue 9, 2014, Pages 2762-2769

  Qin, Hailang ^a   Sutter, Peter ^b   Zhou, Guangwen ^a  

^a State University of New York at Binghamton   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM ALLOYS; ALUMINUM METALLOGRAPHY; ANNEALING; BINARY ALLOYS; ELECTRONS; FLOCCULATION; NICKEL METALLOGRAPHY; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; THIN FILMS;

AMORPHOUS ALUMINUM OXIDE; AMORPHOUS OXIDES; ANNEALING TEMPERATURES; ANNEALING TIME; CRITICAL TEMPERATURE RANGE; CRYSTALLINE OXIDES; CRYSTALLIZATION PROCESS; LOW ENERGY ELECTRON MICROSCOPY;

ALUMINUM OXIDE;

EID: 84908049691     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/jace.13036     Document Type: Article

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