Tuning the thickness of electrochemically grafted layers in large area molecular junctions

Journal of Applied Physics

Volumn 116, Issue 11, 2014, Pages

  Fluteau, T ^a   Bessis, C ^a   Barraud, C ^a   Della Rocca, M L ^a   Martin, P ^a   Lacroix, J C ^a   Lafarge, P ^a  

^a UNIVERSITÉ PARIS DESCARTES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; GRAFTING (CHEMICAL); SURFACE ROUGHNESS;

ELECTRO REDUCTION; ELECTROCHEMICAL CYCLE; LINEAR DEPENDENCE; MOLECULAR JUNCTION; NUMBER OF CYCLES; RECTIFYING BEHAVIORS; STANDARD CMOS PROCESS; TUNNELING BARRIER;

ULTRATHIN FILMS;

EID: 84907486096     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4896106     Document Type: Article

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