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Journal of the American Chemical Society

Volumn 124, Issue 19, 2002, Pages 5528-5541

Bond insertion, complexation, and penetration pathways of vapor-deposited aluminum atoms with HO- and CH3O-terminated organic monolayers

(11) Fisher, Gregory L c Walker, Amy V a Hooper, Andrew E d Tighe, Timothy B a Bahnck, Kevin B e Skriba, Hope T a Reinard, Michael D a Haynie, Brendan C a Opila, Robert L b Winograd, Nicholas a Allara, David L a

a PENNSYLVANIA STATE UNIVERSITY (United States)

b University of Delaware (United States)

c LOS ALAMOS NATIONAL LABORATORY (United States)

d MOTOROLA INC (United States)

e PFIZER GLOBAL RESEARCH AND DEVELOPMENT (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INFRARED REFLECTANCE SPECTROSCOPY;

CHEMICAL BONDS; INFRARED SPECTROSCOPY; METALLIC FILMS; NUCLEATION; POLYCRYSTALLINE MATERIALS; REACTION KINETICS; SECONDARY ION MASS SPECTROMETRY; SELF ASSEMBLY; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM;

ALUMINUM; CARBON; ETHER; GOLD; HYDROGEN; HYDROXYL GROUP; METAL; METHYL GROUP; NONMETAL; ORGANIC COMPOUND; ORGANOMETALLIC COMPOUND; OXYGEN; SOLVENT;

ARTICLE; CALCULATION; CHEMICAL BOND; COMPLEX FORMATION; ENERGY; FILM; MASS SPECTROMETRY; MOLECULAR INTERACTION; QUANTUM CHEMISTRY; REFLECTOMETRY; SURFACE PROPERTY; VAPOR; X RAY PHOTOELECTRON SPECTROSCOPY;

ALCOHOLS; ALUMINUM; ETHERS; GASES; HYDROCARBONS; MASS SPECTROMETRY; SPECTROPHOTOMETRY, INFRARED; SULFHYDRYL COMPOUNDS; SURFACE PROPERTIES;

EID: 0037094023 PISSN: 00027863 EISSN: None Source Type: Journal
DOI: 10.1021/ja0123453 Document Type: Article

Times cited : (187)

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