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Volumn 567, Issue , 2014, Pages 20-31

Study of wet etching thin films of indium tin oxide in oxalic acid by monitoring the resistance

Author keywords

Activation energy; Electrical resistance; Etch rate; Morphology; Selective etching; X ray reflectivity

Indexed keywords

ACTIVATION ENERGY; CHLORINATION; CHLORINE COMPOUNDS; MORPHOLOGY; ORGANIC ACIDS; OXALIC ACID; POROSITY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; WET ETCHING; X RAY ANALYSIS;

EID: 84906853893     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2014.07.027     Document Type: Article
Times cited : (22)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.