Wet etching mechanisms of ITO films in oxalic acid

Microelectronic Engineering

Volumn 83, Issue 3, 2006, Pages 536-541

  Tsai, Tzu Hsuan ^a   Wu, Yung Fu ^b  

^a TECHNOLOGY AND SCIENCE INSTITUTE OF NORTHERN TAIWAN   (Taiwan)

^b MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Indium tin oxide; Kinetics; Mechanism; Oxalic acid; Wet etching

Indexed keywords

DISSOLUTION RATE; INDIUM TIN OXIDE; OXALIC ACID; WET ETCHING;

CARBOXYLIC ACIDS; DISSOLUTION; ETCHING; IMAGE ANALYSIS; INDIUM COMPOUNDS; PH EFFECTS;

THIN FILMS;

EID: 33244470683     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.12.003     Document Type: Article

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