-
1
-
-
4344568071
-
The use of electroless copper seed in electrochemical deposited copper interconnect
-
W.L. Goh, and K. Tan The use of electroless copper seed in electrochemical deposited copper interconnect Thin Solid Films 462-463 2004 275
-
(2004)
Thin Solid Films
, vol.462-463
, pp. 275
-
-
Goh, W.L.1
Tan, K.2
-
2
-
-
0026815322
-
Growth and configurational stability of circular, buckling-driven film delaminations
-
J. Hutchinson, M. Thouless, and E. Liniger Growth and configurational stability of circular, buckling-driven film delaminations Acta Metall. Mater. 40 2 1992 295
-
(1992)
Acta Metall. Mater.
, vol.40
, Issue.2
, pp. 295
-
-
Hutchinson, J.1
Thouless, M.2
Liniger, E.3
-
3
-
-
0029346335
-
The thermomechanical integrity of thin films and multilayers
-
A. Evans, and J. Hutchinson The thermomechanical integrity of thin films and multilayers Acta Metall. Mater. 43 2 1995 2507
-
(1995)
Acta Metall. Mater.
, vol.43
, Issue.2
, pp. 2507
-
-
Evans, A.1
Hutchinson, J.2
-
4
-
-
84865514876
-
The effect of nickel on the strain evolution in chemical copper films
-
S. Bamberg, L.K. Perry, B. Muir, A. Abuzir, F. Brüning, and R. Brüning The effect of nickel on the strain evolution in chemical copper films Thin Solid Films 520 23 2012 6935
-
(2012)
Thin Solid Films
, vol.520
, Issue.23
, pp. 6935
-
-
Bamberg, S.1
Perry, L.K.2
Muir, B.3
Abuzir, A.4
Brüning, F.5
Brüning, R.6
-
6
-
-
84875671823
-
Stress and strain evolution in electroless copper films evaluated with X-ray diffraction and substrate curvature
-
T. Sharma, R. Brüning, C. Brown, A. Sibley, and J. Etzkorn Stress and strain evolution in electroless copper films evaluated with X-ray diffraction and substrate curvature J. Electrochem. Soc. 160 6 2013 D226
-
(2013)
J. Electrochem. Soc.
, vol.160
, Issue.6
, pp. 226
-
-
Sharma, T.1
Brüning, R.2
Brown, C.3
Sibley, A.4
Etzkorn, J.5
-
7
-
-
84863562765
-
Evolution of microstructure and electrical conductivity of electroless copper deposits on a glass substrate
-
X. Cui, D.A. Hutt, and P.P. Conway Evolution of microstructure and electrical conductivity of electroless copper deposits on a glass substrate Thin Solid Films 520 19 2012 6095
-
(2012)
Thin Solid Films
, vol.520
, Issue.19
, pp. 6095
-
-
Cui, X.1
Hutt, D.A.2
Conway, P.P.3
-
11
-
-
0034333905
-
Surface stress model for intrinsic stresses in thin films
-
R. Cammarata, T. Trimble, and D. Srolovitz Surface stress model for intrinsic stresses in thin films J. Mater. Res. 15 11 2000 2468
-
(2000)
J. Mater. Res.
, vol.15
, Issue.11
, pp. 2468
-
-
Cammarata, R.1
Trimble, T.2
Srolovitz, D.3
-
12
-
-
4344583080
-
Effect of processing parameters on electroless Cu seed layer properties
-
Y.C. Ee, Z. Chen, L. Chan, A.K.H. See, S. Law, K.C. Tee, K.Y. Zeng, and L. Shen Effect of processing parameters on electroless Cu seed layer properties Thin Solid Films 462-463 2004 197
-
(2004)
Thin Solid Films
, vol.462-463
, pp. 197
-
-
Ee, Y.C.1
Chen, Z.2
Chan, L.3
See, A.K.H.4
Law, S.5
Tee, K.C.6
Zeng, K.Y.7
Shen, L.8
-
14
-
-
79954435973
-
Strain in electroless copper films monitored by x-ray diffraction during and after deposition and its dependence on bath chemistry
-
R. Brüning, B. Muir, E. McCalla, E. Lempereur, F. Brüning, and J. Etzkorn Strain in electroless copper films monitored by x-ray diffraction during and after deposition and its dependence on bath chemistry Thin Solid Films 519 13 2011 4377
-
(2011)
Thin Solid Films
, vol.519
, Issue.13
, pp. 4377
-
-
Brüning, R.1
Muir, B.2
McCalla, E.3
Lempereur, E.4
Brüning, F.5
Etzkorn, J.6
-
15
-
-
84876079372
-
A study of low temperature and low stress electroless copper plating bath
-
L.-S. Li, X.-R. Li, W.-X. Zhao, Q. Ma, X.-B. Lu, and Z.-L. Wang A study of low temperature and low stress electroless copper plating bath Int. J. Electrochem. Sci. 8 4 2013 5191
-
(2013)
Int. J. Electrochem. Sci.
, vol.8
, Issue.4
, pp. 5191
-
-
Li, L.-S.1
Li, X.-R.2
Zhao, W.-X.3
Ma, Q.4
Lu, X.-B.5
Wang, Z.-L.6
-
16
-
-
68849090441
-
Compressive stress generation in Sn thin films and the role of grain boundary diffusion
-
J. Shin, and E. Chason Compressive stress generation in Sn thin films and the role of grain boundary diffusion Phys. Rev. Lett. 103 2009 056102
-
(2009)
Phys. Rev. Lett.
, vol.103
, pp. 056102
-
-
Shin, J.1
Chason, E.2
-
17
-
-
0030408924
-
Residual stresses in thermal spray coatings and their effect on interfacial adhesion: A review of recent work
-
T. Clyne, and S. Gill Residual stresses in thermal spray coatings and their effect on interfacial adhesion: a review of recent work J. Therm. Spray Technol. 5 4 1996 401
-
(1996)
J. Therm. Spray Technol.
, vol.5
, Issue.4
, pp. 401
-
-
Clyne, T.1
Gill, S.2
|