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Volumn 138, Issue , 2014, Pages 476-480
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Self-purification model for metal-assisted chemical etching of metallurgical silicon
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Author keywords
etching model; Metal assisted chemical etching; metallurgical silicon; purification effect; transitional metal impurity
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Indexed keywords
ETCHING;
IMPURITIES;
METAL IONS;
METALLURGY;
NANOWIRES;
POROUS SILICON;
PURIFICATION;
SILICON;
CHEMICAL REDUCTION;
DISSOLVED METAL IONS;
METAL-ASSISTED CHEMICAL ETCHING;
METALLURGICAL-GRADE SILICON;
POROUS SILICON NANOWIRES;
PURIFICATION EFFECT;
SELF-PURIFICATION;
TRANSITIONAL METALS;
METALS;
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EID: 84905010904
PISSN: 00134686
EISSN: None
Source Type: Journal
DOI: 10.1016/j.electacta.2014.05.048 Document Type: Article |
Times cited : (13)
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References (28)
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