ZnTe thin films grown by electrodeposition technique on Fluorine Tin Oxide substrates

Thin Solid Films

Volumn 564, Issue , 2014, Pages 195-200

  Skhouni, O ^b   El Manouni, A ^a,b   Mollar, M ^a   Schrebler, R ^c   Mari B ^a  

^a UNIVERSITAT POLITÈCNICA DE VALÈNCIA   (Spain)

^b HASSAN II UNIVERSITY OF CASABLANCA   (Morocco)

^c PONTIFICIA UNIVERSIDAD CATÓLICA DE VALPARAÍSO   (Chile)

Author keywords

Electrochemical impedance; Electrodeposition; Optical properties; Thin films; Zinc telluride

Indexed keywords

ELECTRODEPOSITION; FLUORINE; OPTICAL PROPERTIES; SUBSTRATES; TIN; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION; ZINC; ZINC COMPOUNDS;

CHARGE TRANSFER PROCESS; ELECTRICAL CONDUCTIVITY; ELECTROCHEMICAL IMPEDANCE; ELECTRODEPOSITED FILMS; ELECTRODEPOSITION TECHNIQUE; ENERGY DISPERSIVE X-RAY; IMPEDANCE MEASUREMENT; ZINC TELLURIDES;

THIN FILMS;

EID: 84904042156     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2014.06.002     Document Type: Article

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