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Volumn , Issue , 2014, Pages 78-81

Effects of Ar plasma and Ar fast atom bombardment (FAB) treatments on Cu/polymer hybrid surface for wafer bonding

Author keywords

3D packaging; Cu polymer hybrid bonding; Surface activated bonding (SAB); Wafer bonding

Indexed keywords

ELECTRONICS PACKAGING; METAL CLADDING; PLASMAS; POLYMERS; SURFACE TREATMENT; WAFER BONDING; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84903718775     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICEP.2014.6826665     Document Type: Conference Paper
Times cited : (13)

References (10)
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    • (2006) Appl. Phys. Lett. , vol.89 , Issue.4 , pp. 042110
    • Tong, Q.-Y.1    Fountain, G.2    Enquist, P.3
  • 2
    • 84855900964 scopus 로고    scopus 로고
    • Investigation of fluorine containing plasma activation for room-temperature bonding of Si-based materials
    • Feb.
    • C. Wang and T. Suga, "Investigation of fluorine containing plasma activation for room-temperature bonding of Si-based materials," Microelectron. Reliab., vol. 52, no. 2, pp. 347-351, Feb. 2012.
    • (2012) Microelectron. Reliab. , vol.52 , Issue.2 , pp. 347-351
    • Wang, C.1    Suga, T.2
  • 4
    • 84855873096 scopus 로고    scopus 로고
    • Low temperature bonding technology for 3D integration
    • Feb.
    • C.-T. Ko and K.-N. Chen, "Low temperature bonding technology for 3D integration," Microelectron. Reliab., vol. 52, no. 2, pp. 302-311, Feb. 2012.
    • (2012) Microelectron. Reliab. , vol.52 , Issue.2 , pp. 302-311
    • Ko, C.-T.1    Chen, K.-N.2
  • 8
    • 0037350078 scopus 로고    scopus 로고
    • Room temperature Cu-Cu direct bonding using surface activated bonding method
    • Feb.
    • T. H. Kim, M. M. R. Howlader, T. Itoh, and T. Suga, "Room temperature Cu-Cu direct bonding using surface activated bonding method," J. Vac. Sci. Technol. A, vol. 21, no. 2, pp. 449-453, Feb. 2003.
    • (2003) J. Vac. Sci. Technol. A , vol.21 , Issue.2 , pp. 449-453
    • Kim, T.H.1    Howlader, M.M.R.2    Itoh, T.3    Suga, T.4
  • 9
    • 33646507032 scopus 로고    scopus 로고
    • Bumpless interconnect through ultrafine Cu electrodes by means of surface-activated bonding (SAB) method
    • May
    • A. Shigetou, T. Itoh, M. Matsuo, N. Hayasaka, K. Okumura, and T. Suga, "Bumpless interconnect through ultrafine Cu electrodes by means of surface-activated bonding (SAB) method," IEEE Trans. Adv. Packag., vol. 29, no. 2, pp. 218-226, May 2006.
    • (2006) IEEE Trans. Adv. Packag. , vol.29 , Issue.2 , pp. 218-226
    • Shigetou, A.1    Itoh, T.2    Matsuo, M.3    Hayasaka, N.4    Okumura, K.5    Suga, T.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.