Ferroelectric switching in epitaxial GeTe films

APL Materials

Volumn 2, Issue 6, 2014, Pages

  Kolobov, A V ^a   Kim, D J ^b   Giussani, A ^c   Fons, P ^a   Tominaga, J ^a   Calarco, R ^c   Gruverman, A ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^c PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84903688922     PISSN: None     EISSN: 2166532X     Source Type: Journal    
DOI: 10.1063/1.4881735     Document Type: Article

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