Cutaneous exposure scenarios for engineered nanoparticles used in semiconductor fabrication: A preliminary investigation of workplace surface contamination

International Journal of Occupational and Environmental Health

Volumn 20, Issue 3, 2014, Pages 247-257

  Shepard, Michele ^a   Brenner, Sara ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

Cutaneous; Dermal; Nanoparticle; Occupational exposure; Skin; Surface sample

Indexed keywords

ALUMINUM OXIDE; CERIC OXIDE; CERIUM; NANOPARTICLE; SILICON DIOXIDE;

ARTICLE; CUTANEOUS,; DERMAL,; ENVIRONMENTAL MONITORING; EVALUATION STUDY; INDUSTRY; METHODOLOGY; NANOPARTICLE,; OCCUPATIONAL EXPOSURE; OCCUPATIONAL EXPOSURE,; SEMICONDUCTOR; SKIN ABSORPTION; SKIN,; SURFACE SAMPLE; TRANSMISSION ELECTRON MICROSCOPY; VACUUM; WORKPLACE;

CUTANEOUS,; DERMAL,; NANOPARTICLE,; OCCUPATIONAL EXPOSURE,; SKIN,; SURFACE SAMPLE;

ALUMINUM OXIDE; CERIUM; ENVIRONMENTAL MONITORING; INDUSTRY; MICROSCOPY, ELECTRON, TRANSMISSION; NANOPARTICLES; OCCUPATIONAL EXPOSURE; SEMICONDUCTORS; SILICON DIOXIDE; SKIN ABSORPTION; VACUUM; WORKPLACE;

EID: 84903382860     PISSN: 10773525     EISSN: None     Source Type: Journal    
DOI: 10.1179/2049396714Y.0000000074     Document Type: Review

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