Nitrogen doping for adhesion improvement of DLC film deposited on Si substrate by Filtered Cathodic Vacuum Arc (FCVA) technique

Applied Surface Science

Volumn 310, Issue , 2014, Pages 284-292

  Bootkul, D ^a   Supsermpol, B ^b   Saenphinit, N ^b   Aramwit, C ^c   Intarasiri, S ^c  

^a SRINAKHARINWIROT UNIVERSITY   (Thailand)

^b Western Digital (Thailand) Co Ltd   (Thailand)

^c CHIANG MAI UNIVERSITY   (Thailand)

Author keywords

Diamond like carbon (DLC); Filtered Cathodic Vacuum Arc (FCVA); Nano scratch tester; Nitrogen doped tetrahedral amorphous carbon (ta C:N); Tetrahedral amorphous carbon (ta C)

Indexed keywords

ADHESION; AMORPHOUS CARBON; AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; BIOCOMPATIBILITY; CARBON FILMS; CORROSION PROTECTION; DIAMOND LIKE CARBON FILMS; HARDNESS; NITROGEN; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SILICON WAFERS; SUBSTRATES; SURFACE ROUGHNESS; VACUUM APPLICATIONS; VACUUM TECHNOLOGY;

DIAMOND LIKE CARBON; FILTERED CATHODIC VACUUM ARC; NANO-SCRATCH TESTER; TETRAHEDRAL AMORPHOUS CARBON; TETRAHEDRAL AMORPHOUS CARBON (TA-C);

AMORPHOUS FILMS;

EID: 84903314909     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2014.03.059     Document Type: Article

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