Sol-gel production of aluminium doped zinc oxide using aluminium nitrate

Materials Science in Semiconductor Processing

Volumn 27, Issue 1, 2014, Pages 19-25

  Bu, Ian Y Y ^a  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

Author keywords

Electrical properties; Nanostructures; Semiconductors; Sol gel chemistry

Indexed keywords

ELECTRIC PROPERTIES; NANOSTRUCTURES; NANOWIRES; NITRATES; OPTICAL DATA PROCESSING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SINTERING; SOL-GEL PROCESS; SOL-GELS; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION; ZINC COMPOUNDS; ZINC OXIDE;

HALL EFFECT MEASUREMENT; OPTICAL MEASUREMENT; OPTICAL TRANSPARENCY; OPTOELECTRONIC PROPERTIES; PROCESS TEMPERATURE; SINTERING TEMPERATURES; SOL-GEL CHEMISTRY; SPIN COATING PROCESS; ALUMINIUM NITRATES; DOPED ZINC OXIDES;

ALUMINUM; ELECTRIC PROPERTIES;

EID: 84903287444     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2014.06.011     Document Type: Article

References (32)

1. P. Ding, X. Pan, J. Huang, H. He, B. Lu, and H. Zhang et al. J. Cryst. Growth 331 2011 15 17
2. C.F. Klingshirn, B.K. Meyer, A. Waag, A. Hoffmann, and J.M.M. Geurts Zinc Oxide: From Fundamental Properties Towards Novel Applications 2010 Springer Verlag Berlin, Germany
3. X. Jiang, F. Wong, M. Fung, and S. Lee Appl. Phys. Lett. 83 2003 1875
4. J. Hassan, M. Mahdi, A. Ramizy, H. Abu Hassan, and Z. Hassan Superlattices Microstruct. 53 2012 31 38
5. I.Y.Y. Bu, and C.C. Yang Superlattices Microstruct. 51 2012 745 753
6. U.H. Bakhtiar, R. Ahmed, R. Khenata, M. Ahmed, and R. Hussain Mater. Sci. Semicond. Process. 16 2013 1162 1169
7. L.E. Greene, B.D. Yuhas, M. Law, D. Zitoun, and P. Yang Inorg. Chem. 45 2006 7535 7543
8. T. Minami, H. Nanto, and S. Takata Jpn. J. Appl. Phys. 23 1984 L280 L282
9. B. Xiang, P. Wang, X. Zhang, Shadi. A. Dayeh, D.P.R. Aplin, and C. Soci et al. Nano Lett. 7 2007 323 328
10. K. Narasimhan, S. Pai, V. Palkar, and R. Pinto Thin Solid Films 295 1997 104 106
11. S. Jongthammanurak, M. Witana, T. Cheawkul, and C. Thanachayanont Mater. Sci. Semicond. Process. 2012
12. T. Saeed, and P. O'Brien Thin Solid Films 271 1995 35 38
13. W. Tang, and D. Cameron Thin Solid Films 238 1994 83 87
14. T. Pauporté, and D. Lincot J. Electroanal. Chem. 517 2001 54 62
15. R. Laudise, E. Kolb, and A. Caporaso J. Am. Ceram. Soc. 47 1964 9 12
16. I.Y.Y. Bu J Alloys Compd. 509 2011 2874 2878
17. V. Avrutin, D.J. Silversmith, and H. Morkoç Proc. IEEE. 98 2010 1269 1280
18. X. Zi-qiang, D. Hong, L. Yan, and C. Hang Mater. Sci. Semicond. Process. 9 2006 132 135
19. Q.-B. Ma, Z.-Z. Ye, H.-P. He, L.-P. Zhu, and B.-H. Zhao Mater. Sci. Semicond. Process. 10 2007 167 172
20. L. Znaidi, G.S. Illia, R. Le Guennic, C. Sanchez, and A. Kanaev J. Sol-Gel Sci. Technol. 26 2003 817 821
21. S.-Y. Kuo, W.-C. Chen, F.-I. Lai, C.-P. Cheng, H.-C. Kuo, and S.-C. Wang et al. J. Cryst. Growth 287 2006 78 84
22. N. Fujimura, T. Nishihara, S. Goto, J. Xu, and T. Ito J. Cryst. Growth 130 1993 269 279
23. A. Van der Drift Philips Res. Rep. 22 1967 267 288
24. S. Zhang, S.-H. Wei, and A. Zunger Phys. Rev. B 63 2001 075205
25. K. Vanheusden, W. Warren, C. Seager, D. Tallant, J. Voigt, and B. Gnade J. Appl. Phys. 79 1996 7983 7990
26. I.Y. Bu J. Alloys Compd. 509 2011 2874 2878
27. Y. Lan, X. Chen, Y. Cao, Y. Xu, L. Xun, and T. Xu et al. J. Cryst. Growth 207 1999 247 250
28. H. Usui, T. Kono, and H. Sakaguchi Int. J. Electrochem. Sci. 2012 7
29. Y. Wang, S. Lau, X. Zhang, H. Lee, H. Hng, and B. Tay J. Cryst. Growth 252 2003 265 269
30. A. Kaschner, U. Haboeck, M. Strassburg, M. Strassburg, G. Kaczmarczyk, and A. Hoffmann et al. Appl. Phys. Lett. 80 2002 1909 1911
31. T.-H. Yang, and J.-M. Wu Acta Mater. 60 2012 3310 3320
32. I.Y. Bu Appl. Surf. Sci. 257 2011 6107 6111