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Volumn 4, Issue 47, 2014, Pages 24458-24462

Optimization of silicon pyramidal emitter by self-selective Ag-assisted chemical etching

(11) Yang, Lixia a,b Liu, Yaoping a,b Wang, Yan a,b Li, Xiuqing c Chen, Wei a,b Hua, Yongyun c Zhang, Qinjie c Fu, Jianqi c Liang, Huili a,b Mei, Zengxia a,b Du, Xiaolong a,b

a INSTITUTE OF PHYSICS (China)

b INSTITUTE OF GEOLOGY AND GEOPHYSICS (China)

c Beijing Flight Boda Electronics Ltd (China)

Author keywords

[No Author keywords available]

Indexed keywords

COLLECTOR EFFICIENCY; ETCHING; OPEN CIRCUIT VOLTAGE; SCANNING ELECTRON MICROSCOPY; SILICON; SILVER; SOLAR CELLS;

AUGER RECOMBINATION; CHEMICAL ETCHING; ENHANCED EFFICIENCY; EXTERNAL QUANTUM EFFICIENCY; MINORITY CARRIER; SCANNING ELECTRON MICROSCOPY IMAGE; SILICON SURFACES; SOLAR-CELL APPLICATIONS;

SILICON WAFERS;

EID: 84902683152 PISSN: None EISSN: 20462069 Source Type: Journal
DOI: 10.1039/c4ra03120b Document Type: Article

Times cited : (22)

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