Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 9051, Issue , 2014, Pages

  Chaudhari, Atul ^a,b   Ghoshal, Tandra ^a,b   Shaw, Matthew T ^a,b,c   Cummins, Cian ^a,b   Borah, Dipu ^a,b   Holmes, Justin D ^a,b   Morris, Michael A ^a,b  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b TRINITY COLLEGE DUBLIN   (Ireland)

^c Intel Ireland Ltd   (Ireland)

Author keywords

Block copolymers; High polymers; Metal oxide inclusion; Polymer brushes; Solvent annealing

Indexed keywords

ASPECT RATIO; ETHYLENE GLYCOL; MICROELECTRONICS; NANOWIRES; POLYMERS; SELF ASSEMBLED MONOLAYERS; SOLVENTS; STYRENE;

COPOLYMER STRUCTURE; EFFECT OF ANNEALING; IRON OXIDE NANOWIRES; METAL OXIDES; MICROELECTRONICS INDUSTRY; POLYMER BRUSHES; SILICON SUBSTRATES; SOLVENT ANNEALING;

BLOCK COPOLYMERS;

EID: 84902097251     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2046044     Document Type: Conference Paper

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