Preparation of Na delta-doped p-type ZnO thin films by pulsed laser deposition using NaF and ZnO ceramic targets

Thin Solid Films

Volumn 540, Issue , 2013, Pages 53-57

  Liu, H B ^a   Pan, X H ^a   Huang, J Y ^a   He, H P ^a   Ye, Z Z ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Characterization; P Type conduction; Pulsed laser deposition; Semiconducting materials; Zinc compounds

Indexed keywords

CERAMIC MATERIALS; CHARACTERIZATION; DEPOSITION; FILM PREPARATION; HALL MOBILITY; HOLE CONCENTRATION; HOLE MOBILITY; METALLIC FILMS; OPTICAL FILMS; PULSED LASER DEPOSITION; PULSED LASERS; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR DOPING; SODIUM; SUBSTRATES; ZINC COMPOUNDS; ZINC OXIDE;

CERAMIC TARGET; DELTA LAYERS; LASER DEPOSITIONS; P TYPE ZNO THIN FILM; P-TYPE CONDUCTION; QUARTZ SUBSTRATE; SEMICONDUCTING MATERIALS; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 84901843061     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.05.133     Document Type: Article

References (24)

1. C. Klingshirn, J. Fallert, H. Zhou, J. Sartor, C. Thiele, F. Maier-Flaig, D. Schneider, H. Kalt, Phys. Status Solidi B 247 (2010) 1424.
2. S. Chu, J. Lim, L. Mandalapu, Z. Yang, L. Li, J. Liu, Appl. Phys. Lett. 92 (2008) 152103.
3. D.C. Look, Mater. Sci. Eng. B 80 (2001) 383.
4. Y. Heo, L. Tien, D. Norton, B. Kang, F. Ren, B. Gila, S. Pearton, Appl. Phys. Lett. 85 (2004) 2002.
5. A. Baltakesmez, S. Tekmen, S. Tüzemen, J. Appl. Phys. 110 (2011) 054502.
6. K. Liu, J. Ma, J. Zhang, Y. Lu, D. Jiang, B. Li, D. Zhao, Z. Zhang, B. Yao, D. Shen, Solid State Electron. 51 (2007) 757.
7. S. Roy, S. Basu, Bull. Mater. Sci. 25 (2002) 513.
8. S.B. Zhang, S.H. Wei, A. Zunger, Phys. Rev. B: Condens. Matter 63 (2001) 075205.
9. D.C. Look, G.C. Farlow, P. Reunchan, S. Limpijumnong, S.B. Zhang, K. Nordlund, Phys. Rev. Lett. 95 (2005) 225502.
10. C. Park, S. Zhang, S.H. Wei, Phys. Rev. B: Condens. Matter 66 (2002) 073202.
11. E.C. Lee, K. Chang, Phys. Rev. B: Condens. Matter 70 (2004) 115210.
12. B.K. Meyer, J. Stehr, A. Hofstaetter, N. Volbers, A. Zeuner, J. Sann, Appl. Phys. A 88 (2007) 119.
13. J.J. Lai, Y.J. Lin, Y.H. Chen, H.C. Chang, C.J. Liu, Y.Y. Zou, Y.T. Shih, M.C. Wang, J. Appl. Phys. 110 (2011) 013704.
14. J.G. Lu, K. Huang, X.M. Chen, J.B. Zhu, C.B. Cao, X.P. Song, Z.Q. Sun, Opt. Commun. 284 (2011) 2905.
15. S.S. Lin, Z.Z. Ye, J.G. Lu, H.P. He, L.X. Chen, X.Q. Gu, J.Y. Huang, L.P. Zhu, B.H. Zhao, J. Phys. D: Appl. Phys. 41 (2008) 155114.
16. W. Liu, F.X. Xiu, K. Sun, Y.H. Xie, K.L. Wang, Y. Wang, J. Zou, Z. Yang, J.L. Liu, J. Am. Chem. Soc. 132 (2010) 2498.
17. S.S. Lin, J.G. Lu, Z.Z. Ye, H.P. He, X.Q. Gu, L.X. Chen, J.Y. Huang, B.H. Zhao, Solid State Commun. 148 (2008) 25.
18. S.S. Lin, H.P. He, Y.F. Lu, Z.Z. Ye, J. Appl. Phys. 106 (2009) 093508.
19. T.F. Yao, S.K. Hong, Oxide and Nitride Semiconductors, Springer Press, Berlin Heidelberg, 2009.
20. C.E.C. Wood, G. Metze, J. Berry, L.F. Eastman, J. Appl. Phys. 51 (1980) 383.
21. J.L. Demiguel, S.M. Shibli, M.C. Tamargo, B.J. Skromme, Appl. Phys. Lett. 53 (1988) 2065.
22. Z. Zhu, G.D. Brownlie, G. Horsburgh, P.J. Thompson, S.Y. Wang, K.A. Prior, B.C. Cavenett, Appl. Phys. Lett. 67 (1995) 2167.
23. H.D. Jung, C.D. Song, S.Q. Wang, K. Arai, Y.H. Wu, Z. Zhu, T. Yao, H. KatayamaYoshida, Appl. Phys. Lett. 70 (1997) 1143.
24. W.W. Liu, B. Yao, Y.F. Li, B.H. Li, Z.Z. Zhang, C.X. Shan, J.Y. Zhang, D.Z. Shen, X.W. Fan, J. Alloys Compd. 504 (2010) 484.