Nickel oxide growth on Si (111), c-Al2O3 and FTO/glass by pulsed laser deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8987, Issue , 2014, Pages

  Sandana, V E ^a   Rogers, D J ^a   Hosseini Teherani, F ^a   Bove, P ^a   McClintock, R ^b   Razeghi, M ^b  

^a 8 Route de Chevreuse France   (France)

^b NORTHWESTERN UNIVERSITY   (United States)

Author keywords

DSSC; FTO Glass; NiO; P type semiconductor; Pulsed Laser Deposition

Indexed keywords

ALUMINUM; AMORPHOUS SILICON; DYE-SENSITIZED SOLAR CELLS; EPITAXIAL GROWTH; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON; SOLAR CELLS; SUBSTRATES; X RAY DIFFRACTION;

DSSC; FTO/GLASS; GRAIN ORIENTATION; GROWTH DIRECTIONS; LOWER TEMPERATURES; NIO; P TYPE SEMICONDUCTOR; TEMPERATURE-SENSITIVE;

NICKEL OXIDE;

EID: 84901796597     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2057620     Document Type: Conference Paper

References (31)

1. S. Chakrabarty and K. Chatterjee Journal of Physical Sciences, 13 (2009) 245
2. P. S. Patil & L. D. Kadam (2002) Appl Surf Sci 199:211-221
3. S. Huffner S (1994) Adv Phys 43:183
4. L. Ai et al. Applied Surface Science 254 (8), (2008) 2401
5. C. G. Granqvist, Handbook of Inorganic Electrochimics Materials, Elsevier, Amsterdam, 1995.
6. Z. Zhai et al. Nanoscale (2012) 4, 547
7. Xiaowei et al. J. Mater. Chem. (2012) 22, 14276
8. A. Azens et al. Solid State Ionics 113-115, (1998) 449
9. H. Ohta et al. Thin Solid Films 445, 2, (2003), 317
10. W. Shin & N. Murayama Materials Letters 45, 6, (2000) 302
11. A. Dirksen, et al. Sensors and Actuators B: Chemical 80, 2, 20 (2001) 106
12. S. Bai et al. Adv. Energy Mater. (2013) 1, online publication, DOI 10. 1002aenm. 201301460
13. A. Vu et al. Adv. Energy Mater. (2012) 2, 1056
14. P. I. Cowin, et al. Adv. Energy Mater. (2011) 1, 314
15. Y. Y. Xi et al. Appl. Phys. Lett. 92 (2008) 113505-1
16. H. Shimotani et al. Appl. Phys. Lett. 92 24 (2008) 242107
17. S. Zhang et al. Energy Environ. Sci. 6 (2013) 1443-1464.
18. A. Nakasa et al. Chem. Lett. 34 (2005) 500.
19. F. Odobel et al. Coord. Chemi. Rev. 256 (2012) 2414-2423.
20. M. Awais et al. Chem. Electro. Chem, 2, (2014) 384-391
21. D. Rogers et al. Proc. of SPIE Vol. 7217 (2009) 72170F-1.
22. V. E. Sandana et al. Phys. Status Solidi C 10 (2013) No. 10, 1317-1321.
23. B Sasi et al. Nanotechnology 18 (2007) 115613 (9pp)
24. S. Pilban Jahromi et al. Journal of Nanomaterials Volume 2012, Article ID 173825, 4 pages
25. A. Largeneau et al. U. P. B. Sci. Bull., Series A, Vol. 73. 3, 2011
26. I. Bouessay et al. Applied Surface Science 186 (2002) 490-495
27. P. Blkova et al. Appl. Phys. A 79, 1061-1065 (2004)
28. M. Stamataki et al. Phys. Stat. Sol. (a) 205, No. 8, 2064-2068 (2008)
29. H. Wang et al. Electrochemistry Communications 18 (2012) 92-95
30. X. Sun et al. Adv. Energy Mater. (2013) online publication, DOI: 10. 1002/aenm. 201300912
31. H. B. Yang et al. Adv. Mater. Interfaces (2014) online publication, DOI: 10. 1002/admi. 201300110