Pulsed laser deposition of the porous nickel oxide thin film at room temperature for high-rate pseudocapacitive energy storage

Electrochemistry Communications

Volumn 18, Issue 1, 2012, Pages 92-95

  Wang, Huanwen ^a   Wang, Yalan ^a   Wang, Xuefeng ^a  

^a TONGJI UNIVERSITY   (China)

Author keywords

NiO; Pulsed laser deposition; Supercapacitor; Thin film

Indexed keywords

CAPACITANCE RETENTION; CYCLING PERFORMANCE; ELECTROCHEMICAL ENERGY STORAGE; FILM ELECTRODES; HIGH CURRENT DENSITIES; HIGH RATE; ION TRANSPORTS; NIO; NIO FILMS; NIO THIN FILM; POROUS NICKEL; POROUS STRUCTURES; PSEUDOCAPACITIVE; RATE CAPABILITIES; REACTIVE DEPOSITION; ROOM TEMPERATURE; SPECIFIC CAPACITANCE; SUPER CAPACITOR;

CAPACITANCE; DEPOSITION; ENERGY STORAGE; NICKEL OXIDE; PULSED LASER DEPOSITION; THIN FILMS; VAPOR DEPOSITION;

ELECTROCHEMICAL ELECTRODES;

EID: 84860526390     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2012.02.023     Document Type: Article

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