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Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1061-1065

Reactive pulsed laser deposition of zinc oxide thin films

(6) Bilkova P a Mitu, B b Marotta, V c Mattei, G c Orlando, S c Santagata, A c

a CHARLES UNIVERSITY (Czech Republic)

b NATIONAL INSTITUTE FOR LASER (Romania)

c CNR (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC SURFACE WAVE DEVICES; CHEMICAL VAPOR DEPOSITION; LASER ABLATION; PHOTOELECTRICITY; RAMAN SPECTROSCOPY; SEMICONDUCTOR MATERIALS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

GASEOUS SPECIES; OPTICAL TRANSPARENCY; RADIOFREQUENCY (RF) PLASMA; THERMAL FLUCTUATION STABILITY;

PULSED LASER DEPOSITION;

EID: 4344574015 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-004-2629-7 Document Type: Conference Paper

Times cited : (18)

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