Self limiting deposition of pyrite absorbers by pulsed PECVD

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 2, 2014, Pages

  Sentman, Christopher D ^a   O'Brien, Maria ^b   Wolden, Colin A ^a  

^a Department of Geology and Geological Engineering   (United States)

^b TRINITY COLLEGE DUBLIN   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY GAP; GROWTH RATE; MIXTURES; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PYRITES; SULFIDE MINERALS; TEMPERATURE; THIN FILMS;

ABSORPTION CO-EFFICIENT; CONTINUOUS DELIVERIES; IRON PENTACARBONYLS; LOW TEMPERATURES; PULSED PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PYRITE THIN FILMS; SELF-LIMITING GROWTHS; THERMAL CHEMICAL VAPOR DEPOSITION;

PLASMA CVD;

EID: 84900660263     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4828818     Document Type: Article

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