Fully crystallized ultrathin ITO films deposited by sputtering with in-situ electron beam irradiation for touch-sensitive screens

Ceramics International

Volumn 40, Issue 7 PART B, 2014, Pages 11163-11169

  Wie, Sung Min ^a   Hong, Chan Hwa ^a,b   Oh, Seung Kyu ^a   Cheong, Woo Seok ^b   Yoon, Young Joon ^c   Kwak, Joon Seop ^a  

^a Sunchon National University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^c Korea Institute of Ceramic Engineering and Technology (KICET)   (South Korea)

Author keywords

Electron beam irradiation; Indium tin oxide; Touch sensitive screens

Indexed keywords

CARRIER CONCENTRATION; ELECTRON BEAMS; ENERGY TRANSFER; IRRADIATION; TIN; TOUCH SCREENS;

BURSTEIN-MOSS SHIFT; ELECTRON BEAM IRRADIATION; ELECTRON-BEAM IRRADIATIONS; HALL MEASUREMENTS; HIGH TRANSMITTANCE; INDIUM TIN OXIDE; TRANSPARENT ELECTRODE; VISIBLE WAVELENGTHS;

ULTRATHIN FILMS;

EID: 84900498600     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2014.03.145     Document Type: Article

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