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Volumn 113, Issue 2, 2013, Pages 263-272

Structuring of photosensitive material below diffraction limit using far field irradiation

Author keywords

[No Author keywords available]

Indexed keywords

EXPERIMENTAL APPROACHES; FABRICATION STRATEGIES; INTERFERENCE PATTERNS; PHOTOSENSITIVE MATERIALS; PHOTOSENSITIVE POLYMERS; SURFACE RELIEF GRATINGS; TOPOGRAPHICAL CHANGES; TWO-BEAM INTERFEROMETRY;

EID: 84900217267     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-013-7945-3     Document Type: Article
Times cited : (34)

References (49)
  • 7
    • 0001749149 scopus 로고    scopus 로고
    • J.F. Rabeck (CRC, Boca Raton)
    • H. Rau, in Photochemistry and Photophysics, vol. III, ed. by J.F. Rabeck (CRC, Boca Raton, 2009), p. 119
    • (2009) Photochemistry and Photophysics , vol.3 , pp. 119
    • Rau, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.