Subwavelength photoresist patterning using liquid-immersion interference exposure with a deep-UV hologram mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7202, Issue , 2009, Pages

  Sawaki, Daisuke ^a   Amako, Jun ^a  

^a SEIKO EPSON CORPORATION   (Japan)

Author keywords

Deep UV laser; Hologram mask; Liquid immersion; Lithography; Resist patterning; Subwavelength structure; Two beam interference

Indexed keywords

DEEP-UV LASER; LIQUID IMMERSION; RESIST PATTERNING; SUBWAVELENGTH STRUCTURE; TWO-BEAM INTERFERENCE;

HOLOGRAMS; LASERS; LIGHT; LIQUIDS; LITHOGRAPHY; PHOTORESISTS; PLASMA ETCHING; REACTIVE ION ETCHING; TEMPERATURE CONTROL;

PHASE INTERFACES;

EID: 65649140521     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.808809     Document Type: Conference Paper

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