Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

Optics Express

Volumn 17, Issue 26, 2009, Pages 23522-23529

  Elfstrom D ^a   Guilhabert, B ^a   McKendry, J ^a   Poland, S ^a   Gong, Z ^a   Massoubre, D ^a   Richardson, E ^a   Rae, B R ^b   Valentine, G ^a,b,c   Bianco Gomez, G ^a,b,c   Gu, E ^a,b,c   Cooper, J M ^a,b,c   Henderson, R K ^a,b,c   Dawson, M D ^a,b,c  

^a UNIVERSITY OF STRATHCLYDE   (United Kingdom)

^b UNIVERSITY OF EDINBURGH   (United Kingdom)

^c UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

GALLIUM NITRIDE; LIGHT EMISSION; LIGHT EMITTING DIODES; METALLIC COMPOUNDS; MOS DEVICES; PHOTOLITHOGRAPHY; PHOTORESISTORS; PHYSICAL OPTICS; PIXELS; SEMICONDUCTOR DIODES; SURFACE TREATMENT; WATER ANALYSIS;

COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; DEMAGNIFICATION; DIRECT WRITING; LIGHT EMITTING DIODE ARRAYS; MICRO-PIXEL; MICROSCOPE OBJECTIVE; NEGATIVE PHOTORESISTS; ULTRA-VIOLET; ULTRAVIOLET PHOTOLITHOGRAPHY; UV LIGHT;

GALLIUM ALLOYS;

ARTICLE; COMPUTER AIDED DESIGN; ELECTRONICS; EQUIPMENT; EQUIPMENT DESIGN; ILLUMINATION; INSTRUMENTATION; MATERIALS; PHOTOCHEMISTRY; PHOTOGRAPHY; RADIATION EXPOSURE; SEMICONDUCTOR; ULTRAVIOLET RADIATION;

COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LIGHTING; MANUFACTURED MATERIALS; MINIATURIZATION; PHOTOCHEMISTRY; PHOTOGRAPHY; SEMICONDUCTORS; ULTRAVIOLET RAYS;

EID: 73949124146     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.023522     Document Type: Article

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