Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS

Surface and Coatings Technology

Volumn 250, Issue , 2014, Pages 21-25

  Nguyen, D T ^a   Ferrec, A ^a   Keraudy, J ^a   Richard Plouet, M ^a   Goullet, A ^a   Cattin, L ^a   Brohan, L ^a   Jouan, P Y ^a  

^a UNIVERSITÉ DE NANTES   (France)

Author keywords

Ellipsometry; Nickel oxide; P Type semi conductor; Reactive HiPIMS; X ray photoelectron spectroscopy

Indexed keywords

ELECTRONIC PROPERTIES; ELLIPSOMETRY; FILM GROWTH; PHOTOELECTRONS; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL COMPOSITIONS; EXTINCTION COEFFICIENTS; GROWTH DIRECTIONS; NICKEL OXIDE THIN FILMS; OPTOELECTRONIC PROPERTIES; REACTIVE HIPIMS; REFRACTIVE INDEX GRADIENTS; XPS CHARACTERIZATION;

NICKEL OXIDE;

EID: 84899952722     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2014.02.014     Document Type: Article

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