메뉴 건너뛰기




Volumn 35, Issue 5, 2014, Pages 515-517

Asymmetric InGaAs/InP MOSFETs with source/drain engineering

Author keywords

InGaAs MOSFET; oscillation frequency.; source drain engineering; voltage gain

Indexed keywords

GAIN MEASUREMENT; GALLIUM;

EID: 84899725361     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2014.2308925     Document Type: Article
Times cited : (29)

References (14)
  • 1
    • 84857484181 scopus 로고    scopus 로고
    • fT = 688 GHz and fmax = 800 GHz in Lg = 40 nm In0.7Ga0.3As MHEMTs with gmmax 2.7 mS/?m Dec.
    • D.-H. Kim, B. Brar, and J. A. del Alamo, "fT = 688 GHz and fmax = 800 GHz in Lg = 40 nm In0.7Ga0.3As MHEMTs with gmmax 2.7 mS/?m," in Proc. IEEE IEDM, Dec. 2011, pp. 13.6.1-13.6.4.
    • (2011) Proc. IEEE IEDM , pp. 1361-1364
    • Kim, D.-H.1    Brar, B.2    Del Alamo, J.A.3
  • 2
    • 84871760126 scopus 로고    scopus 로고
    • Narrow-width effect on high-frequency performance and RF noise of sub-40nm multifinger nMOSFETs and pMOSFETS
    • Jan.
    • K.-L. Yeh, and J.-C. Guo, "Narrow-width effect on high-frequency performance and RF noise of sub-40nm multifinger nMOSFETs and pMOSFETS," IEEE Trans. Electron Devices, vol. 60, no. 1, pp. 109-116, Jan. 2013.
    • (2013) IEEE Trans. Electron Devices , vol.60 , Issue.1 , pp. 109-116
    • Yeh, K.-L.1    Guo, J.-C.2
  • 3
    • 84885421296 scopus 로고    scopus 로고
    • Sub-30nm InAs quantum-well MOSFETs with self-aligned metal contacts and sub-1nm EOT HfO2 insulator
    • Dec.
    • J. Lin, D. A. Antoniadis, and J. A. del Alamo, "Sub-30nm InAs quantum-well MOSFETs with self-aligned metal contacts and sub-1nm EOT HfO2 insulator," in Proc. IEEE IEDM, Dec. 2012, pp. 32.1.1-32.1.4.
    • (2012) Proc. IEEE IEDM , pp. 3211-3214
    • Lin, J.1    Antoniadis, D.A.2    Del Alamo, J.A.3
  • 4
    • 84870555996 scopus 로고    scopus 로고
    • Lg = 60 nm recessed In0.7Ga0.3As metal-oxidesemiconductor field-effect transistors with Al2O3 insulator
    • D. H. Kim et al., "Lg = 60 nm recessed In0.7Ga0.3As metal-oxidesemiconductor field-effect transistors with Al2O3 insulator," Appl. Phys. Lett., vol. 101, no. 22, pp. 223507-1-223507-4, 2012.
    • (2012) Appl. Phys. Lett. , vol.101 , Issue.22 , pp. 2235071-2235074
    • Kim, D.H.1
  • 5
    • 84899710684 scopus 로고    scopus 로고
    • Regrown ohmic contacts to InxGa1?xAs approaching the quantum conductivity limit
    • Jun.
    • J. J. M. Law et al. "Regrown ohmic contacts to InxGa1?xAs approaching the quantum conductivity limit," in Proc. IEEE DRC, Jun. 2012, pp. 199-200.
    • (2012) Proc. IEEE DRC , pp. 199-200
    • Law, J.J.M.1
  • 6
    • 84899748591 scopus 로고    scopus 로고
    • High transconductance surface channel In0.53Ga0.47As MOSFETs using MBE source-drain regrowth and surface digital etching
    • May
    • S. Lee et al., "High transconductance surface channel In0.53Ga0.47As MOSFETs using MBE source-drain regrowth and surface digital etching," in Proc. IEEE IPRM, May 2013, pp. 1-2.
    • (2013) Proc. IEEE IPRM , pp. 1-2
    • Lee, S.1
  • 7
    • 84862578573 scopus 로고    scopus 로고
    • High drain current (2A/mm) InGaAs channel MOSFET at VD=0.5V with shrinkage of channel length by InP anisotropic etching
    • Dec.
    • Y. Yonai et al., "High drain current (2A/mm) InGaAs channel MOSFET at VD=0.5V with shrinkage of channel length by InP anisotropic etching," in Proc. IEEE IEDM, Dec. 2011, pp. 13.3.1-13.3.4.
    • (2011) Proc. IEEE IEDM , pp. 1331-1334
    • Yonai, Y.1
  • 8
    • 84899730425 scopus 로고    scopus 로고
    • Sub-50-nm InGaAs MOSFET with n-InP source on Si substrate
    • May
    • A. Kato et al., "Sub-50-nm InGaAs MOSFET with n-InP source on Si substrate," in Proc. IEEE IPRM, May 2013, pp. 1-2.
    • (2013) Proc. IEEE IPRM , pp. 1-2
    • Kato, A.1
  • 9
    • 84889836345 scopus 로고    scopus 로고
    • High performance raised source/drain InAs/In0.53Ga0.47As channel metal-oxide-semiconductor field-effecttransistors with reduced leakage using a vertical spacer
    • S. Lee et al., "High performance raised source/drain InAs/In0.53Ga0.47As channel metal-oxide-semiconductor field-effecttransistors with reduced leakage using a vertical spacer," Appl. Phys. Lett., vol. 103, no. 23, pp. 233503-1-233503-4, 2013.
    • (2013) Appl. Phys. Lett. , vol.103 , Issue.23 , pp. 2335031-2335034
    • Lee, S.1
  • 10
    • 84897388952 scopus 로고    scopus 로고
    • A new self-aligned quantum-well MOSFET architecture fabricated by a scalable tight-pitch process
    • Dec.
    • J. Lin et al., "A new self-aligned quantum-well MOSFET architecture fabricated by a scalable tight-pitch process," in Proc. IEEE IEDM, Dec. 2013, pp. 16.2.1-16.2.4.
    • (2013) Proc. IEEE IEDM , pp. 1621-1624
    • Lin, J.1
  • 11
    • 84857453827 scopus 로고    scopus 로고
    • High frequency performance of self-aligned gate-last channel In0.53Ga0.47As MOSFET
    • Mar.
    • M. Egard et al., "High frequency performance of self-aligned gate-last channel In0.53Ga0.47As MOSFET," IEEE Electron Device Lett., vol. 33, no. 3, pp. 369-371, Mar. 2012.
    • (2012) IEEE Electron Device Lett. , vol.33 , Issue.3 , pp. 369-371
    • Egard, M.1
  • 12
    • 84885426910 scopus 로고    scopus 로고
    • 30nm enhancement-mode In0.53Ga0.47As MOSFETs on Si substrates grown by MOCVD exhibiting high transconductance and low on-resistance
    • Dec.
    • X. Zhou et al., "30nm enhancement-mode In0.53Ga0.47As MOSFETs on Si substrates grown by MOCVD exhibiting high transconductance and low on-resistance," in Proc. IEEE IEDM, Dec. 2012, pp. 32.5.1-32.5.4.
    • (2012) Proc. IEEE IEDM , pp. 3251-3254
    • Zhou, X.1
  • 13
    • 83455203427 scopus 로고    scopus 로고
    • RF characterization of vertical InAs nanowire wrap-gate transistors integrated on Si substrates
    • Oct.
    • S. Johansson et al., "RF characterization of vertical InAs nanowire wrap-gate transistors integrated on Si substrates," IEEE Trans. Microw. Theory Tech., vol. 59, no. 10, pp. 2733-2738, Oct. 2011.
    • (2011) IEEE Trans. Microw. Theory Tech. , vol.59 , Issue.10 , pp. 2733-2738
    • Johansson, S.1
  • 14
    • 84887462717 scopus 로고    scopus 로고
    • GaAs MESFET with source-connected field plate for high voltage MMICs
    • Apr.
    • M. L. Balzan, M. J. Drinkwine, and T. A. Winslow, "GaAs MESFET with source-connected field plate for high voltage MMICs," in Proc. CS MANTECH Conf., Apr. 2008, pp. 2-4.
    • (2008) Proc. CS MANTECH Conf. , pp. 2-4
    • Balzan, M.L.1    Drinkwine, M.J.2    Winslow, T.A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.