Closed batch initiated chemical vapor deposition of ultrathin, functional, and conformal polymer films

Langmuir

Volumn 30, Issue 16, 2014, Pages 4830-4837

  Petruczok, Christy D ^a   Chen, Nan ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLIC MONOMERS; CHEMICAL VAPOR DEPOSITION; POLYMER FILMS; SEMICONDUCTING FILMS; ULTRATHIN FILMS; VAPORS;

CONFORMAL COVERAGE; CONFORMAL POLYMERS; CONTINUOUS FLOWS; FABRICATION PROCESS; INITIATED CHEMICAL VAPOR DEPOSITIONS; ORDERS OF MAGNITUDE; POLY (N ISOPROPYLACRYLAMIDE); THICKNESS UNIFORMITY;

POLYMERS;

EID: 84899632258     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la500543d     Document Type: Article

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