Modeling of laser-induced chemical vapor deposition of silicon carbide rods from tetramethylsilane

Journal of the American Ceramic Society

Volumn 83, Issue 8, 2000, Pages 1947-1952

  Shaarawi, Mohammed S ^a,b   Sanchez, Juan M ^b   Kan, Honghua ^b   Manthiram, Arumugam ^a,b  

^a AMERICAN CERAMIC SOCIETY   (United States)

^b The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL FLUID DYNAMICS; FINITE DIFFERENCE METHOD; INFILTRATION; LASER BEAM EFFECTS; MATHEMATICAL MODELS; MORPHOLOGY; POWDERS; RATE CONSTANTS; SILANES; SILICON CARBIDE; STRUCTURAL CERAMICS;

LASER INDUCED CHEMICAL VAPOR DEPOSITION (LCVD); SELECTIVE AREA LASER DEPOSITION VAPOR INFILTRATION (SALDVI); TETRAMETHYLSILANE (TMS);

CHEMICAL VAPOR DEPOSITION;

EID: 0034247561     PISSN: 00027820     EISSN: None     Source Type: None    
DOI: 10.1111/j.1151-2916.2000.tb01495.x     Document Type: Article

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