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Nanoscale

Volumn 6, Issue 10, 2014, Pages 5156-5161

Strain engineering of selective chemical adsorption on monolayer MoS 2

(4) Kou, Liangzhi a Du, Aijun b Chen, Changfeng c Frauenheim, Thomas a

a UNIVERSITY OF BREMEN (Germany)

b QUEENSLAND UNIVERSITY OF TECHNOLOGY (Australia)

c UNIVERSITY OF NEVADA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CARBON DIOXIDE; CHEMICAL DETECTION; ELECTROMECHANICAL DEVICES; MAGNETIC MOMENTS; MONOLAYERS;

AB INITO CALCULATIONS; CHEMICAL ADSORPTION; ELECTRONIC PHASE TRANSITION; ENHANCED ADSORPTIONS; MOLYBDENUM DISULFIDE; SENSITIVE DETECTION; STRAIN ENGINEERING; ULTRA-HIGH-SENSITIVITY;

MOLYBDENUM COMPOUNDS;

EID: 84899540693 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c3nr06670c Document Type: Article

Times cited : (197)

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