Synergetic effect of benzotriazole and non-ionic surfactant on copper chemical mechanical polishing in KIO4-based slurries

Thin Solid Films

Volumn 558, Issue , 2014, Pages 272-278

  Jiang, Liang ^a,b   He, Yongyong ^a   Niu, Xiangyu ^b   Li, Yuzhuo ^b   Luo, Jianbin ^a  

^a TSINGHUA UNIVERSITY   (China)

^b CLARKSON UNIVERSITY   (United States)

Author keywords

Benzotriazole; Copper chemical mechanical polishing; Non ionic surfactant; Potassium periodate

Indexed keywords

CHEMICAL MECHANICAL POLISHING; COPPER; HYDROPHOBICITY; PASSIVATION; POLISHING; POLYPROPYLENE OXIDES; POLYPROPYLENES; RUTHENIUM;

BENZOTRIAZOLE(BTA); BENZOTRIAZOLES; CHEMICAL DISSOLUTION; CHEMICAL-MECHANICAL POLISHING PROCESS; COPPER CHEMICAL-MECHANICAL POLISHING; COPPER INTERCONNECTS; MATERIAL REMOVAL RATE; MECHANICAL ABRASION;

COPPER COMPOUNDS;

EID: 84898795226     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2014.01.086     Document Type: Article

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