Improvement of haze ratio of DC (direct current)-sputtered ZnO: Al thin films through HF (hydrofluoric acid) vapor texturing

Energy

Volumn 66, Issue , 2014, Pages 20-24

  Lee, Youn Jung ^a   Park, Hyeongsik ^a   Ju, Minkyu ^a   Kim, Youngkuk ^b   Park, Jinjoo ^a   Ai, Dao Vinh ^a   Qamar Hussain, S ^a   Lee, Youngseok ^a   Ahn, Shihuyn ^a   Yi, Junsin ^a  

^a Sungkyunkwan University   (South Korea)

^b Hanwha Corporation   (South Korea)

Author keywords

Haze; High transmittance; Texture; Thin film Si solar cell; Vaporized HF; ZnO:Al

Indexed keywords

ALUMINUM; CHLORINE COMPOUNDS; ETCHING; METALLIC FILMS; PRODUCTION ENGINEERING; SILICON SOLAR CELLS; SUBSTRATES; TEXTURES; THIN FILMS; VAPORS; ZINC OXIDE;

HAZE; HIGH TRANSMITTANCE; HYDROGEN CHLORIDE; MASS PRODUCTION PROCESS; THIN FILM SOLAR CELLS; THIN-FILM SI SOLAR CELLS; ZNO : AL THIN FILMS; ZNO:AL; REPRODUCIBILITIES; ZNO:AL THIN FILMS;

HYDROFLUORIC ACID;

FILM; FUEL CELL; GLASS; SUBSTRATE; TRANSMITTANCE; CONCENTRATION (COMPOSITION); ETCHING; HYDROFLUORIC ACID; PHOTOVOLTAIC SYSTEM; SOLAR RADIATION; TEXTURE; VAPOR PRESSURE; WAVELENGTH;

EID: 84896332105     PISSN: 03605442     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.energy.2013.09.001     Document Type: Article

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