Subwavelength single layer absorption resonance antireflection coatings

Optics Express

Volumn 22, Issue 1, 2014, Pages 490-497

  Huber, S P ^a   Van De Kruijs, R W E ^a   Yakshin, A E ^a   Zoethout, E ^a   Boller, K J ^b   Bijkerk, F ^a,b  

^a FOM INSTITUTE DIFFER   (Netherlands)

^b UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; DEPOSITION; EXTREME ULTRAVIOLET LITHOGRAPHY; FILM PREPARATION; ION IMPLANTATION; OPTICAL CONSTANTS; PHASE SHIFT; PHASE SHIFTERS; REFLECTION; SILICON; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS;

ABSORPTION RESONANCES; ADDITIONAL PHASE SHIFTS; LAYER THICKNESS; MULTI-LAYER MIRRORS; PROOF OF PRINCIPLES; SUB-WAVELENGTH; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

ANTIREFLECTION COATINGS;

ABSORPTION; ARTICLE; ARTIFICIAL MEMBRANE; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; ENERGY TRANSFER; EQUIPMENT DESIGN; EQUIPMENT FAILURE; LIGHT; OPTICAL INSTRUMENTATION; RADIATION SCATTERING; SURFACE PROPERTY; THEORETICAL MODEL;

ABSORPTION; COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; ENERGY TRANSFER; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LENSES; LIGHT; MEMBRANES, ARTIFICIAL; MODELS, THEORETICAL; SCATTERING, RADIATION; SURFACE PROPERTIES;

EID: 84892652623     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.22.000490     Document Type: Article

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