The effects of substrate self-biasing on the growth of Sn-catalysed silicon nanowires grown at low pressure

Journal of Materials Science

Volumn 49, Issue 5, 2014, Pages 2078-2084

  Ball, J ^a   Mendis, B G ^b   Reehal, H S ^a  

^a LONDON SOUTH BANK UNIVERSITY   (United Kingdom)

^b DURHAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST STABILITY; CHEMICAL VAPOUR DEPOSITION; DEPOSITION PRESSURES; ION BOMBARDMENT ENERGY; MEAN-FREE PATH; SILICON NANOWIRE ARRAYS; SILICON NANOWIRES; SILICON SUBSTRATES;

CATALYSTS; CHEMICAL VAPOR DEPOSITION; ION BOMBARDMENT; NANOWIRES; TIN; WIRE;

SUBSTRATES;

EID: 84892443002     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-013-7898-0     Document Type: Article

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