An XPS depth-profile study on electrochemically deposited TaOx

Journal of Solid State Electrochemistry

Volumn 17, Issue 12, 2013, Pages 3115-3123

  Sheng Moo, James Guo ^a   Awaludin, Zaenal ^a   Okajima, Takeyoshi ^a   Ohsaka, Takeo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Depth profile; Electrochemical deposition; Tantalumpentoxide; TaOx; XPS

Indexed keywords

DEPTH PROFILING; ELECTROCHEMICAL DEPOSITION; ETCHING; GLASS MEMBRANE ELECTRODES; REDUCTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CONSTANT POTENTIAL ELECTROLYSIS; CORE SHELL STRUCTURE; CYCLIC VOLTAMMETRIC; ELECTRODE SURFACES; GLASSY CARBON ELECTRODES; NON-HYDROLYTIC CONDENSATION; TANTALUM PENTOXIDE; TAOX;

TANTALUM OXIDES;

EID: 84892372300     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-013-2216-y     Document Type: Article

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