Mask-free and programmable patterning of graphene by ultrafast laser direct writing

Chemical Physics

Volumn 430, Issue , 2014, Pages 13-17

  Chen, Hao Yan ^c   Han, Dongdong ^a   Tian, Ye ^b   Shao, Ruiqiang ^a   Wei, Shu ^a  

^a JILIN UNIVERSITY   (China)

^b CHANGCHUN UNIVERSITY OF TECHNOLOGY   (China)

^c CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Carbon materials; Graphene oxide; Patterning; Raman; Ultra fast laser

Indexed keywords

EID: 84891847937     PISSN: 03010104     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.chemphys.2013.12.005     Document Type: Article

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