The characteristics of cu2O thin films deposited using rf-magnetron sputtering method with nitrogen-ambient

ETRI Journal

Volumn 35, Issue 6, 2013, Pages 1156-1159

  Lee, Seong Hyun ^a   Yun, Sun Jin ^a   Lim, Jung Wook ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Cu2O; Cuprite; High energy gap; Nitrogen; Sputter

Indexed keywords

CUPRITE; ELECTRICAL AND OPTICAL PROPERTIES; FEEDING AMOUNT; FUNCTIONAL FILMS; HETEROJUNCTION SOLAR CELLS; INTERMEDIATE PHASE; OPTICAL AND ELECTRICAL PROPERTIES; RF-MAGNETRON SPUTTERING;

ELECTRIC PROPERTIES; ENERGY GAP; FLOW RATE; HETEROJUNCTIONS; NITROGEN; SPUTTERING;

THIN FILMS;

EID: 84891717427     PISSN: 12256463     EISSN: 22337326     Source Type: Journal    
DOI: 10.4218/etrij.13.0213.0216     Document Type: Article

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