UV-led lithography for 3-D high aspect ratio microstructure patterning

Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop

Volumn , Issue , 2012, Pages 481-484

  Kim, Jungkwun ^a   Paik, Seung Joon ^a   Herrault, Florian ^a   Allen, Mark G ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; ASPECT RATIO; CELL PROLIFERATION; COST REDUCTION; LIGHT EMITTING DIODES; MICROSTRUCTURE; MICROSYSTEMS; POLYMERS; SOLID-STATE SENSORS;

CONVENTIONAL LITHOGRAPHY; HIGH ASPECT RATIO; HIGH ASPECT RATIO MICROSTRUCTURES; LIGHT COLLIMATION; POLYMER MICROSTRUCTURES; POLYMER STRUCTURE; THREEDIMENSIONAL (3-D); ULTRAVIOLET LIGHT EMITTING DIODES;

LITHOGRAPHY;

EID: 84891710922     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.31438/trf.hh2012.127     Document Type: Conference Paper

References (13)

1. Marc J. Madou, Fundamentals of Microfabrication, CRC press, Florida, 2001.
2. Lin, Burn Jeng, "Deep UV lithography", Journal of Vacuum Science and Technology, Vol 12, Issue 6, (1975), pp1317-1320.
3. K Jiang, M J Lancaster, I Llamas-Garro, P Jin, "SU-8 Ka-band filter and its microfabrication", J. Micromech. Microeng. 15 (2005) 1522-1526.
4. Hsiharng Yang, Ching-Kong Chao, Mau-Kuo Wei, Che-Ping Lin, "High fill-factor microlens array mold insert fabrication using a thermal reflow process", 2004 J. Micromech. Microeng. 14 1197.
5. Jungkwun ''JK'' Kim, Mark G. Allen and Yong-Kyu ''YK'' Yoon, "Computer controlled dynamic mode multidirectional UV lithography for 3-D microfabrication," 2011 J. Micromech. Microeng. 21 035003.
6. Hyeon-Don Kim, Gun-Wook Yoon, Jeongho Yeon, Joo-Hyung Lee and Jun-Bo Yoon, "Fabrication of a uniform microlens array over a large area using self-aligned diffuser lithography (SADL)", J. Micromech. Microeng. 22 (2012) 045002 (7pp).
7. Jungkwun ''JK'' Kim, Kangsun Lee, Kwang W. Oh and Yong-Kyu ''YK'' Yoon, "Microfabrication of rounded channel and waveguide integrated microlens using timed development and thermal reflow process," uTAS, the 13th international conference, Jeju, Korea, Nov 2009.
8. Rosanne M. Guijt, Michael C. Breadmore, "Maskless photolithography using UV LEDs", Lab Chip, 2008, 1402-1404.
9. S. Suzuki, Y. Matsumoto, "Lithography with UV-LED array for curved surface structure", Microsyst Technol (2008) 14:1291-1297.
10. [Accessed: 3 April 2012].
11. [Accessed: 3 April 2012].
12. Hamamatsu Photonics Germany GmbH
13. [Accessed: 3 April 2012].