Lithography with UV-LED array for curved surface structure

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1291-1297

  Suzuki, S ^a   Matsumoto, Y ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; LENSES; LINGUISTICS; LITHOGRAPHY; MICROLENSES; NONMETALS; OPTICAL DESIGN; OPTICAL ENGINEERING; OPTICAL INSTRUMENTS; PRESSURE DROP; RESINS; SENSORS; SILICON; SILICON WAFERS; SURFACES;

CURVED SURFACES; DIRECTIVITY; EXPOSURE TIME; FABRICATED STRUCTURES; GRAY SCALE MASK; HIGH ASPECT RATIOS; HIGH-ASPECT RATIO STRUCTURES; LED ARRAYS; LIGHT GUIDING; MICRO LENSING; OPTICAL DEVICE FABRICATION; SMOOTH SURFACES; UV DOSES; UV-CURABLE;

SURFACE STRUCTURE;

EID: 49949100707     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0544-5     Document Type: Conference Paper

References (4)

1. Hanai K, Nakahara T, Matsumoto Y (2005) Fabrication of micro overhanging structures of SU-8 by using inclined rotary exposure. In: Proceedings of the 22nd sensor symposium, pp 516-519
2. Waits CM, Morgan B, Kastantin M, Ghodssi R (2005) Microfabrication of 3D silicon MEMS structures using gray-scale lithography and deep reactive ion etching. Sensors Actuat A 119:245-253
3. Herzig H.P., Stern M.B. (1997) Micro-optics. Taylor & Francis Ltd, San Francisco, pp 71-77
4. Hanai K, Nakahara T, Matsumoto Y (2004) Optical elements of SU-8 by using Grayscale lithography and substrate penetration method. In: Proceeding of optical MEMS 2004, pp 148-149