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Volumn 103, Issue 24, 2013, Pages

The influence of surface properties on the plasma dynamics in radio-frequency driven oxygen plasmas: Measurements and simulations

(4) Greb, Arthur a Niemi, Kari a O'Connell, Deborah a Gans, Timo a

a UNIVERSITY OF YORK (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED; DISTRIBUTION OF PARTICLES; IN-SITU MEASUREMENT; IONIZATION DYNAMICS; PHASE RESOLVED OPTICAL EMISSION SPECTROSCOPY; PLASMA-SURFACE INTERFACE; SINGLET DELTA OXYGEN; SURFACE LOSS PROBABILITIES;

CHEMICAL BONDS; DYNAMICS; ELECTRONEGATIVITY; EMISSION SPECTROSCOPY; OXYGEN; PLASMA DIAGNOSTICS;

SURFACES;

EID: 84890454910 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4841675 Document Type: Article

Times cited : (45)

References (30)

1
- 70350070424
- 10.1063/1.3242382
- K. Niemi, S. Reuter, L. M. Graham, J. Waskoenig, and T. Gans, Appl. Phys. Lett. 95, 151504 (2009). 10.1063/1.3242382
- (2009) Appl. Phys. Lett. , vol.95 , pp. 151504
- Niemi, K.¹ Reuter, S.² Graham, L.M.³ Waskoenig, J.⁴ Gans, T.⁵

2
- 77949534094
- 10.1088/0022-3727/43/12/124006
- K. Niemi, S. Reuter, L. M. Graham, J. Waskoenig, N. Knake, V. Schulz-von der Gathen, and T. Gans, J. Phys. D: Appl. Phys. 43, 124006 (2010). 10.1088/0022-3727/43/12/124006
- (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 124006
- Niemi, K.¹ Reuter, S.² Graham, L.M.³ Waskoenig, J.⁴ Knake, N.⁵ Schulz-Von Der Gathen, V.⁶ Gans, T.⁷

3
- 84878404647
- 10.1088/0022-3727/46/23/235201
- P. A. Delattre, T. Lafleur, E. Johnson, and J. P. Booth, J. Phys. D: Appl. Phys. 46, 235201 (2013). 10.1088/0022-3727/46/23/235201
- (2013) J. Phys. D: Appl. Phys. , vol.46 , pp. 235201
- Delattre, P.A.¹ Lafleur, T.² Johnson, E.³ Booth, J.P.⁴

4
- 84878898997
- 10.1063/1.4804280
- A. Greb, K. Niemi, D. O'Connell, G. J. Ennis, N. MacGearailt, and T. Gans, Phys. Plasmas 20, 053502 (2013). 10.1063/1.4804280
- (2013) Phys. Plasmas , vol.20 , pp. 053502
- Greb, A.¹ Niemi, K.² O'Connell, D.³ Ennis, G.J.⁴ Macgearailt, N.⁵ Gans, T.⁶

5
- 27744564154
- 10.1088/0963-0252/14/4/011
- G. J. M. Hagelaar and L. C. Pitchford, Plasma Sources Sci. Technol. 14, 722 (2005). 10.1088/0963-0252/14/4/011
- (2005) Plasma Sources Sci. Technol. , vol.14 , pp. 722
- Hagelaar, G.J.M.¹ Pitchford, L.C.²

6
- 0001381888
- 10.6028/jres.100.032
- P. A. Miller, G. A. Hebner, K. E. Greenberg, P. D. Pochan, and B. P. Aragon, J. Res. Natl. Inst. Stand. Technol. 100, 427 (1995). 10.6028/jres.100.032
- (1995) J. Res. Natl. Inst. Stand. Technol. , vol.100 , pp. 427
- Miller, P.A.¹ Hebner, G.A.² Greenberg, K.E.³ Pochan, P.D.⁴ Aragon, B.P.⁵

7
- 34247194234
- 10.1063/1.2715745
- Y. Sakiyama and D. B. Graves, J. Appl. Phys. 101, 073306 (2007). 10.1063/1.2715745
- (2007) J. Appl. Phys. , vol.101 , pp. 073306
- Sakiyama, Y.¹ Graves, D.B.²

8
- 0442289406
- Y. P. Raizer and M. N. Shneider, High Temp. 29, 833 (1991).
- (1991) High Temp. , vol.29 , pp. 833
- Raizer, Y.P.¹ Shneider, M.N.²

9
- 85014419017
- 10.1088/0963-0252/19/4/045018
- J. Waskoenig, K. Niemi, N. Knake, L. M. Graham, S. Reuter, V. Schulz-von der Gathen, and T. Gans, Plasma Sources Sci. Technol. 19, 045018 (2010). 10.1088/0963-0252/19/4/045018
- (2010) Plasma Sources Sci. Technol. , vol.19 , pp. 045018
- Waskoenig, J.¹ Niemi, K.² Knake, N.³ Graham, L.M.⁴ Reuter, S.⁵ Schulz-Von Der Gathen, V.⁶ Gans, T.⁷

10
- 4944230192
- 10.1063/1.1768615
- D. S. Stafford and M. J. Kushner, J. Appl. Phys. 96, 2451 (2004). 10.1063/1.1768615
- (2004) J. Appl. Phys. , vol.96 , pp. 2451
- Stafford, D.S.¹ Kushner, M.J.²

11
- 23844453629
- 10.1088/0963-0252/14/3/016
- S. G. Belostotsky, D. Economou, D. Lopaev, and T. Rakhimova, Plasma Sources Sci. Technol. 14, 532 (2005). 10.1088/0963-0252/14/3/016
- (2005) Plasma Sources Sci. Technol. , vol.14 , pp. 532
- Belostotsky, S.G.¹ Economou, D.² Lopaev, D.³ Rakhimova, T.⁴

12
- 0034247502
- 10.1088/0963-0252/9/3/310
- H. M. Katsch, T. Sturm, E. Quandt, and H. F. Döbele, Plasma Sources Sci. Technol. 9, 323 (2000). 10.1088/0963-0252/9/3/310
- (2000) Plasma Sources Sci. Technol. , vol.9 , pp. 323
- Katsch, H.M.¹ Sturm, T.² Quandt, E.³ Döbele, H.F.⁴

13
- 0005016275
- 10.1088/0022-3727/33/22/22
- J. T. Gudmundsson, A. M. Marakhtanov, K. K. Patel, V. P. Gopinath, and M. A. Liebermann, J. Phys. D: Appl. Phys. 33, 3010 (2000). 10.1088/0022-3727/33/ 22/22
- (2000) J. Phys. D: Appl. Phys. , vol.33 , pp. 3010
- Gudmundsson, J.T.¹ Marakhtanov, A.M.² Patel, K.K.³ Gopinath, V.P.⁴ Liebermann, M.A.⁵

14
- 0029356696
- 10.1109/27.467998
- B. F. Gordiets, C. M. Ferreira, V. L. Guerra, J. M. A. H. Loureiro, J. Nahorny, D. Pagnon, M. Touzeau, and M. Vialle, IEEE Trans. Plasma Sci. 23, 750 (1995). 10.1109/27.467998
- (1995) IEEE Trans. Plasma Sci. , vol.23 , pp. 750
- Gordiets, B.F.¹ Ferreira, C.M.² Guerra, V.L.³ Loureiro, J.M.A.H.⁴ Nahorny, J.⁵ Pagnon, D.⁶ Touzeau, M.⁷ Vialle, M.⁸

15
- 0001531026
- 10.1063/1.457211
- R. L. Sharpless and T. G. Slanger, J. Chem. Phys. 91, 7947 (1989). 10.1063/1.457211
- (1989) J. Chem. Phys. , vol.91 , pp. 7947
- Sharpless, R.L.¹ Slanger, T.G.²

16
- 0034297709
- 10.1021/jp001640r
- S. M. Newman, A. J. Orr-Ewing, D. A. Newnham, and J. Ballard, J. Phys. Chem. A 104, 9467 (2000). 10.1021/jp001640r
- (2000) J. Phys. Chem. A , vol.104 , pp. 9467
- Newman, S.M.¹ Orr-Ewing, A.J.² Newnham, D.A.³ Ballard, J.⁴

17
- 80053608371
- 10.1088/0963-0252/20/5/055005
- K. Niemi, J. Waskoenig, N. Sadeghi, T. Gans, and D. O'Connell, Plasma Sources Sci. Technol. 20, 055005 (2011). 10.1088/0963-0252/20/5/055005
- (2011) Plasma Sources Sci. Technol. , vol.20 , pp. 055005
- Niemi, K.¹ Waskoenig, J.² Sadeghi, N.³ Gans, T.⁴ O'Connell, D.⁵

18
- 0000708451
- 10.1063/1.363649
- M. Shibata, N. Nakano, and T. Makabe, J. Appl. Phys. 80, 6142 (1996). 10.1063/1.363649
- (1996) J. Appl. Phys. , vol.80 , pp. 6142
- Shibata, M.¹ Nakano, N.² Makabe, T.³

19
- 78649920786
- 10.1088/0963-0252/19/6/065011
- C. Küllig, K. Dittmann, and J. Meichsner, Plasma Sources Sci. Technol. 19, 065011 (2010). 10.1088/0963-0252/19/6/065011
- (2010) Plasma Sources Sci. Technol. , vol.19 , pp. 065011
- Küllig, C.¹ Dittmann, K.² Meichsner, J.³

20
- 0001080060
- 10.1063/1.1306637
- S. V. Berezhnoj, C. B. Shin, U. Buddemeier, and I. Kaganovich, Appl. Phys. Lett. 77, 800 (2000). 10.1063/1.1306637
- (2000) Appl. Phys. Lett. , vol.77 , pp. 800
- Berezhnoj, S.V.¹ Shin, C.B.² Buddemeier, U.³ Kaganovich, I.⁴

21
- 77953010060
- 10.1088/0963-0252/19/3/034010
- T. Gans, D. O'Connell, V. Schulz-von der Gathen, and J. Waskoenig, Plasma Sources Sci. Technol. 19, 034010 (2010). 10.1088/0963-0252/19/3/034010
- (2010) Plasma Sources Sci. Technol. , vol.19 , pp. 034010
- Gans, T.¹ O'Connell, D.² Schulz-Von Der Gathen, V.³ Waskoenig, J.⁴

22
- 0001224690
- 10.1063/1.1315332
- H. M. Katsch, A. Tewes, E. Quandt, A. Goehlich, T. Kawetzki, and H. F. Döbele, J. Appl. Phys. 88, 6232 (2000). 10.1063/1.1315332
- (2000) J. Appl. Phys. , vol.88 , pp. 6232
- Katsch, H.M.¹ Tewes, A.² Quandt, E.³ Goehlich, A.⁴ Kawetzki, T.⁵ Döbele, H.F.⁶

23
- 0032496585
- 10.1063/1.476388
- A. Goehlich, T. Kawetzki, and H. F. Döbele, J. Chem. Phys. 108, 9362 (1998). 10.1063/1.476388
- (1998) J. Chem. Phys. , vol.108 , pp. 9362
- Goehlich, A.¹ Kawetzki, T.² Döbele, H.F.³

24
- 33745268868
- 10.1143/JJAP.45.5203
- A. Salabas and R. P. Brinkmann, Jpn. J. Appl. Phys., Part 1 45, 5203 (2006). 10.1143/JJAP.45.5203
- (2006) Jpn. J. Appl. Phys., Part 1 , vol.45 , pp. 5203
- Salabas, A.¹ Brinkmann, R.P.²

25
- 0022669088
- 10.1063/1.336541
- D. L. Flamm and V. M. Donnelly, J. Appl. Phys. 59, 1052 (1986). 10.1063/1.336541
- (1986) J. Appl. Phys. , vol.59 , pp. 1052
- Flamm, D.L.¹ Donnelly, V.M.²

26
- 0000980672
- 10.1116/1.576219
- E. Gogolides, J. P. Nicolai, and H. H. Sawin, J. Vac. Sci. Technol. A 7, 1001 (1989). 10.1116/1.576219
- (1989) J. Vac. Sci. Technol. A , vol.7 , pp. 1001
- Gogolides, E.¹ Nicolai, J.P.² Sawin, H.H.³

27
- 0000048243
- 10.1103/PhysRevA.36.2782
- J. P. Boeuf, Phys. Rev. A 36, 2782 (1987). 10.1103/PhysRevA.36.2782
- (1987) Phys. Rev. A , vol.36 , pp. 2782
- Boeuf, J.P.¹

28
- 0000204630
- 10.1063/1.372392
- M. Yan, A. Bogaerts, R. Gijbels, and W. J. Goedheer, J. Appl. Phys. 87, 3628 (2000). 10.1063/1.372392
- (2000) J. Appl. Phys. , vol.87 , pp. 3628
- Yan, M.¹ Bogaerts, A.² Gijbels, R.³ Goedheer, W.J.⁴

29
- 51349139860
- 10.1063/1.2972117
- D. O'Connell, T. Gans, E. Semmler, and P. Awakowicz, Appl. Phys. Lett. 93, 081502 (2008). 10.1063/1.2972117
- (2008) Appl. Phys. Lett. , vol.93 , pp. 081502
- O'Connell, D.¹ Gans, T.² Semmler, E.³ Awakowicz, P.⁴

30
- 84870176733
- 10.1088/0741-3335/54/12/124038
- K. Dittmann, C. Küllig, and J. Meichsner, Plasma Phys. Control. Fusion 54, 124038 (2012). 10.1088/0741-3335/54/12/124038
- (2012) Plasma Phys. Control. Fusion , vol.54 , pp. 124038
- Dittmann, K.¹ Küllig, C.² Meichsner, J.³

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