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Volumn 9, Issue 1, 2000, Pages
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Angle-resolved scatterometry for semiconductor manufacturing
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTROMAGNETIC WAVE DIFFRACTION;
ERROR ANALYSIS;
LIGHT POLARIZATION;
LIGHT REFLECTION;
LIGHT SCATTERING;
SEMICONDUCTING FILMS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SENSITIVITY ANALYSIS;
ANGLE-RESOLVED SCATTEROMETRY;
ROOT MEAN SQUARE ERRORS (RMSE);
SUBWAVELENGTH LITHOGRAPHY;
PHOTOLITHOGRAPHY;
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EID: 0033908119
PISSN: 1074407X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
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Times cited : (5)
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References (8)
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