The role of RF measurements in plasma etching: A plasma impedance monitor can help isolate plasma etching problem faster

Semiconductor International

Volumn 20, Issue 9, 1997, Pages 99-104

  Almgren, Carl ^a  

^a Symbios Logic Inc   (United States)

Author keywords

Plasma etching; Process troubleshooting; RF plasma impedance monitoring

Indexed keywords

CATHODES; ELECTRIC IMPEDANCE; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SENSORS; SUBSTRATES;

PLASMA IMPEDANCE MONITORING;

PLASMA ETCHING;

EID: 30844455153     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (2)

1. As demonstrated in process data presented at Poster Session E, Oct. 1996 Gaseous Electronics Conference, Argonne Laboratories, by C. Almgren.
2. K. Ukai and K. Hanazawa, J. Vac. Sci. Technol. 16, 385 (1979)