Effect of oxidizers on chemical mechanical planarization of ruthenium with colloidal silica based slurry

ECS Journal of Solid State Science and Technology

Volumn 2, Issue 1, 2013, Pages

  Cui, Hao ^a   Park, Jin Hyung ^a   Park, Jea Gun ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84887459131     PISSN: 21628769     EISSN: 21628777     Source Type: Journal    
DOI: 10.1149/2.030301jss     Document Type: Article

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