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Electrochemical and Solid-State Letters

Volumn 11, Issue 6, 2008, Pages

Effect of sodium periodate in alumina-based slurry on Ru CMP for metal-insulator-metal capacitor

(7) Kim, In Kwon a Kang, Young Jae a,c Kwon, Tae Young a Cho, Byoung Gwun a Park, Jin Goo a,c Park, Jum Yong b Park, Hyung Soon b

a Hanyang University (South Korea)

b Hynix Semiconductor Inc (South Korea)

c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMICAL ELECTRODES; ETCHING; OXIDANTS; PH EFFECTS; SLURRIES;

CHEMICAL MECHANICAL PLANARIZATION (CMP) SLURRY; SODIUM PERIODATE (NAIO4);

RUTHENIUM;

EID: 42349115845 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.2901544 Document Type: Article

Times cited : (35)

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