SCOPUS 정보 검색 플랫폼

Nanoscale

Volumn 5, Issue 23, 2013, Pages 11598-11603

Rough contact is not always bad for interfacial energy coupling

(3) Zhang, Jingchao a Wang, Yongchun b Wang, Xinwei a,b

a Iowa State University (United States)

b QINGDAO TECHNOLOGICAL UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIRECT CONTACT; ENERGY COUPLINGS; INTERFACIAL THERMAL RESISTANCE; REPULSIVE FORCES; ROUGH SURFACE CONTACTS; SI SUBSTRATES; SUBSTRATE SURFACE; SUSPENDED GRAPHENE;

INTERFACIAL ENERGY; SILICON; SUBSTRATES; SURFACE ROUGHNESS;

GRAPHENE;

EID: 84887456815 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c3nr03913g Document Type: Article

Times cited : (75)

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