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Volumn , Issue , 2008, Pages

Pre-passivation plasma surface treatment effects on critical device electrical parameters of AlGaN/GaN HEMTs

Author keywords

HEMT; Passivation; Plasma; Pulsed I V

Indexed keywords

ALGAN/GAN HEMTS; ELECTRICAL PARAMETER; GATE-LEAKAGE CURRENT; IV CHARACTERISTICS; MANUFACTURABILITY; PLASMA SURFACE TREATMENT; PULSED I-V; SURFACE PLASMA TREATMENT;

EID: 84887440221     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (10)
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    • Kumar, V.1
  • 2
    • 1642359162 scopus 로고    scopus 로고
    • 30 W/mm GaN HEMTs by field plate optimization
    • Y. F. Wu, et al, 30 W/mm GaN HEMTs by Field Plate Optimization, IEEE Electron Device Lett. 25, 117 (2004).
    • (2004) IEEE Electron Device Lett. , vol.25 , pp. 117
    • Wu, Y.F.1
  • 3
    • 14244268595 scopus 로고    scopus 로고
    • Effects of AIGaN/GaN HEMT structure on RF reliability
    • C. Lee, et al, Effects of AIGaN/GaN HEMT structure on RF reliability, Electronics Lett. 41, 155 (2005).
    • (2005) Electronics Lett. , vol.41 , pp. 155
    • Lee, C.1
  • 4
    • 23344433914 scopus 로고    scopus 로고
    • Large-signal performance of deep submicrometer AlGaN/AlN/GaN HEMTs with a field-modulating plate
    • Y. Sun, et al, Large-signal performance of deep submicrometer AlGaN/AlN/GaN HEMTs with a field-modulating plate, IEEE Trans. Electron Devices 52, 1689 (2005).
    • (2005) IEEE Trans. Electron Devices , vol.52 , pp. 1689
    • Sun, Y.1
  • 5
    • 33645646891 scopus 로고    scopus 로고
    • Unpassivated high power deeply recessed GaN HEMTs with fluorine-plasma surface treatment
    • L. Shen, et al, Unpassivated high power deeply recessed GaN HEMTs with fluorine-plasma surface treatment, IEEE Electron Device Lett. 27, 214 (2006).
    • (2006) IEEE Electron Device Lett. , vol.27 , pp. 214
    • Shen, L.1
  • 6
    • 33751584594 scopus 로고    scopus 로고
    • 2 plasma effects on silicon nitride passivation of AlGaN/GaN high electron mobility transistors
    • 2 plasma effects on silicon nitride passivation of AlGaN/GaN high electron mobility transistors, Appl. Phys. Lett. 89, 223523 (2006).
    • (2006) Appl. Phys. Lett. , vol.89 , pp. 223523
    • Meyer, D.J.1
  • 7
    • 84887483650 scopus 로고    scopus 로고
    • Plasma surface pretreatment effects on silicon nitride passivation of AlGaN/GaN HEMTs
    • D. J. Meyer, et al, Plasma Surface Pretreatment Effects on Silicon Nitride Passivation of AlGaN/GaN HEMTs, CS ManTech 2007 Digest, pp. 305-307
    • CS ManTech 2007 Digest , pp. 305-307
    • Meyer, D.J.1
  • 8
    • 0035278804 scopus 로고    scopus 로고
    • The impact of surface states on the DC and RF characteristics of AlGaN/GaN HFETs
    • R. Vetury, et al, The impact of surface states on the DC and RF characteristics of AlGaN/GaN HFETs, IEEE Trans. Electron Devices 48, 560 (2001).
    • (2001) IEEE Trans. Electron Devices , vol.48 , pp. 560
    • Vetury, R.1
  • 9
  • 10
    • 3342926149 scopus 로고    scopus 로고
    • Effects of nitrogen deficiency on electronic properties of AlGaN surfaces subjected to thermal and plasma processes
    • T. Hashizume, et al, Effects of nitrogen deficiency on electronic properties of AlGaN surfaces subjected to thermal and plasma processes, Appl. Surf. Sci. 234, 387 (2004).
    • (2004) Appl. Surf. Sci. , vol.234 , pp. 387
    • Hashizume, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.