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Volumn , Issue , 2008, Pages
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Pre-passivation plasma surface treatment effects on critical device electrical parameters of AlGaN/GaN HEMTs
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Author keywords
HEMT; Passivation; Plasma; Pulsed I V
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Indexed keywords
ALGAN/GAN HEMTS;
ELECTRICAL PARAMETER;
GATE-LEAKAGE CURRENT;
IV CHARACTERISTICS;
MANUFACTURABILITY;
PLASMA SURFACE TREATMENT;
PULSED I-V;
SURFACE PLASMA TREATMENT;
GALLIUM NITRIDE;
HIGH ELECTRON MOBILITY TRANSISTORS;
PASSIVATION;
PLASMAS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICON NITRIDE;
SURFACE TREATMENT;
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EID: 84887440221
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (3)
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References (10)
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