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Volumn 20, Issue 6, 2013, Pages
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Processing-structure-property correlation in DC sputtered molybdenum thin films
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Author keywords
films; Molybdenum; PVD; resistivity; sputtering; strain
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Indexed keywords
CHAMBER PRESSURE;
GLASS SUBSTRATES;
HIGH PRESSURE;
INTERFACIAL STRENGTH;
LOW PRESSURES;
POOR ADHESION;
RESIDUAL STRAINS;
VAN DER PAUW METHOD;
ELECTRIC CONDUCTIVITY;
FILMS;
MOLYBDENUM;
PHYSICAL VAPOR DEPOSITION;
SPUTTERING;
STRAIN;
SUBSTRATES;
THIN FILMS;
TOPOGRAPHY;
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EID: 84887082362
PISSN: 0218625X
EISSN: None
Source Type: Journal
DOI: 10.1142/S0218625X13500650 Document Type: Article |
Times cited : (2)
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References (14)
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